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Surface modification of aluminum and chromium by ion implantation of nitrogen with a high current density ion implanter and plasma-source ion implantation

Published online by Cambridge University Press:  31 January 2011

Zoran Falkenstein ,
Kevin C. Walter ,
Michael A. Nastasi ,
Donald J. Rej  and
Nikolai V. Gavrilov
Zoran Falkenstein
Affiliation:
Los Alamos National Laboratory, P.O. Box 1663, Los Alamos, New Mexico 87545
Kevin C. Walter
Affiliation:
Los Alamos National Laboratory, P.O. Box 1663, Los Alamos, New Mexico 87545
Michael A. Nastasi
Affiliation:
Los Alamos National Laboratory, P.O. Box 1663, Los Alamos, New Mexico 87545
Donald J. Rej
Affiliation:
Los Alamos National Laboratory, P.O. Box 1663, Los Alamos, New Mexico 87545
Nikolai V. Gavrilov
Affiliation:
Institute of Electrophysics, Ural Division of the RAS, 620049 Yekaterinburg, Russia
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Abstract

Results of ion implantation of nitrogen into electrodeposited hard chromium and pure aluminum by a high-dose ion-beam source are presented and compared to plasma-source ion implantation. The large-area, high current density ion-beam source can be characterized, with respect to surface modification use, by a uniform emitted dose rate in the range of 1016 to 5 × 1017 N cm−2 min−1 over an area of <100 cm2 and with acceleration energies of 10–50 keV. The implantation range and retained dose (measured using ion-beam analysis), the surface hardness, coefficient of friction, and the change in the wear coefficient (measured by nanohardness indentation and pin-on-disk wear testing) that were obtained with an applied dose rate of ∼1.7 × 1017 N cm−2 min−1 at 25 kV are given, and they are compared to results obtained with plasma-source ion implantation.

Type
Articles
Information
Journal of Materials Research , Volume 14 , Issue 11 , November 1999 , pp. 4351 - 4357
Copyright
Copyright © Materials Research Society 1999

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