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Surface phenomena in liquid metal alloys of arsenic: Vapor pressure reduction and wetting to refractory metals

Published online by Cambridge University Press:  31 January 2011

M. J. Bozack ,
L. W. Swanson  and
A. E. Bell
M. J. Bozack
Affiliation:
Department of Applied Physics and Electrical Engineering, Oregon Graduate Center, 19600 N.W. Von Neumann Drive, Beaverton, Oregon 97006-1999
L. W. Swanson
Affiliation:
Department of Applied Physics and Electrical Engineering, Oregon Graduate Center, 19600 N.W. Von Neumann Drive, Beaverton, Oregon 97006-1999
A. E. Bell
Affiliation:
Department of Applied Physics and Electrical Engineering, Oregon Graduate Center, 19600 N.W. Von Neumann Drive, Beaverton, Oregon 97006-1999
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Abstract

The influence of surface segregation on wetting of Pd2As and Pd50B25As25 to refractory metals has been studied by sessile drop and surface analytical techniques. The results indicate that the wetting behavior of Pd2As to W is strongly influenced by surface segregation of low-level bulk impurities in the alloy. At melting, the segregating impurities form an inert shell about the liquid alloy which inhibits reaction between alloy and substrate. A poorly-wetted droplet with a large contact angle results. Wetting is elicited by fracture of the high-surface tension shell during heat treatment. The efflux of pure alloy material from the interior of the droplet wets refractory metals with a contact angle of near-zero. The shell remnant floats atop the wetted alloy. Addition of B to the alloy to form Pd50B25As25 results in rapid attack of a Re support. Preliminary studies of the vapor pressure above the alloy and mass analysis of field evaporated ions show that Pd2As may be used as a liquid metal ion source of As. This is possible by means of successful reduction in As vapor pressure by over 10 orders of magnitude.

Type
Articles
Information
Journal of Materials Research , Volume 4 , Issue 1 , February 1989 , pp. 85 - 93
Copyright
Copyright © Materials Research Society 1989

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References

REFERENCES

1Swanson, L. W. and Schwind, G. A., J. Appl. Phys. 49, 5655 (1978).CrossRefGoogle Scholar
2Taylor, G.I., Proc. Roy. Soc. (London) A280, 383 (1964).Google Scholar
3Swanson, L. W., Nucl. Instrum. Methods 218, 347 (1983).CrossRefGoogle Scholar
4Kingham, D., Surf. Sci. 116, 273 (1982).CrossRefGoogle Scholar
5Wagner, A., Nucl. Instrum. Methods 218, 355 (1983).CrossRefGoogle Scholar
6Seliger, R.L., Ward, J.W., Wang, V., and Kubena, R.L., Appl. Phys. Lett. 34, 310 (1979).CrossRefGoogle Scholar
7Bozack, M.J., Swanson, L.W., and Orloff, J., Scanning Electron Micros. IV 1985, 1339.Google Scholar
8Hardy, S. and Fine, J., in Materials Processing in the Reduced Gravity Environment of Space, edited by Rindone, Guy E. (Elsevier, Amsterdam, 1982), p. 503.Google Scholar
9Berglund, S. and Somorjai, G. A., J. Chem. Phys. 59, 5537 (1973).CrossRefGoogle Scholar
10Goumiri, L. and Joud, J.C., Acta Metall. 30, 1397 (1982).CrossRefGoogle Scholar
11Strayer, R.W., Mackie, W., and Swanson, L.W., Surf. Sci. 34, 225 (1973).CrossRefGoogle Scholar
12Larrabee, R.D., J. Opt. Soc. Am. 49, 619 (1959).CrossRefGoogle Scholar
13Marple, D.T.F., J. Opt. Soc. Amer. 46 (1956).Google Scholar
14Palmberg, P. W., Riach, G.E., Weber, R.E., and MacDonald, N.C., Handbook of Auger Electron Spectroscopy (Physical Electronics Industries, Inc., Edina, 1972).Google Scholar
15Merzhanov, A.G., Int. Chem. Eng. 20, 150 (1980).Google Scholar
16Holt, J.B. and Kingman, D.D., Mater. Sci. Res. 17, 167 (1982).Google Scholar
17Behrens, R. G., Materials Science and Technology Division, Materials Chemistry Group, Los Alamos National Laboratory (to be published).Google Scholar
18Saini, G.S., Calvert, L. D., Hevding, R. D., and Taylor, J.B., Can. J. Chem. 42, 620 (1964).CrossRefGoogle Scholar
19Raub, C. J. and Webb, G. W., J. Less-Common Met. 5, 271 (1963).CrossRefGoogle Scholar
20Shunk, F. A., Constitution of Binary Alloys, 2nd Supplement (McGraw-Hill, New York, 1969), p. 59.Google Scholar
21Ishitani, T., Umemura, K., and Tamura, H., Jpn. J. Appl. Phys. 23, L330 (1984).CrossRefGoogle Scholar
22Bozack, M.J., Swanson, L.W., and Orloff, J., Scanning Electron Micros. IV 1985, 1339.Google Scholar
23Swanson, L. W., Schwind, G.A., and Bell, A. E., J. Vac. Sci. Technol. B5 (1), 197 (Jan/Feb 1987).Google Scholar
24Storms, E. K., Materials Science and Technology Division, Los Alamos National Laboratory (to be published).Google Scholar
25Bozack, M.J., Swanson, L.W., and Bell, A. E., J. Phys. Chem. 92, 3925 (1988).CrossRefGoogle Scholar