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Uniformity, composition, and surface tension in solution deposited PbZrxTi1-xO3 films

Published online by Cambridge University Press:  03 March 2011

A. Etin ,
G.E. Shter ,
V. Gelman  and
G.S. Grader
A. Etin
Affiliation:
Chemical Engineering Department, Technion, Haifa 32000, Israel
G.E. Shter
Affiliation:
Chemical Engineering Department, Technion, Haifa 32000, Israel
V. Gelman
Affiliation:
Chemical Engineering Department, Technion, Haifa 32000, Israel
G.S. Grader*
Affiliation:
Chemical Engineering Department, Technion, Haifa 32000, Israel
*
a) Address all correspondence to this author. e-mail: grader@tx.technion.ac.il
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Abstract

High quality, uniform PbZrxTi1-xO3(PZT) films were prepared on the 4 inch wafers by chemical solution deposition (CSD) of 1,3-propanediol precursors. Film uniformity was studied as a function of deposition conditions including spinning rates and co-solvents. Measurements of the surface tension and composition evolution during evaporation and spinning stages showed that the surface tension increases significantly when the co-solvent is nearly completely evaporated. The evaporation of the propanol co-solvent and volatile by-products occurs within the first 5 s of spinning giving rise to defects, whereas octanol is slowly evaporated during 60 s producing uniform coatings. Other co-solvents such as hexanol and pentanol produced uniform films as well. Therefore stabilization of the surface tension in the initial spinning stage is a key to prevent the defect formation. These findings facilitate the deposition of uniform PZT films over large substrates by a simple, scalable, and cost-effective process.

Keywords

FerroelectricFilmSolution deposition
Type
Articles
Information
Journal of Materials Research , Volume 22 , Issue 1 , January 2007 , pp. 103 - 112
Copyright
Copyright © Materials Research Society 2007

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