Hostname: page-component-78c5997874-4rdpn Total loading time: 0 Render date: 2024-11-11T05:45:19.023Z Has data issue: false hasContentIssue false
  • English
  • Français

Measurement of XUV sources' wavefronts

Published online by Cambridge University Press:  30 July 2001

S. LE PAPE ,
PH. ZEITOUN ,
P. DHEZ ,
M. FRANÇOIS ,
M. IDIR ,
D. ROS  and
A. CARILLON
S. LE PAPE
Affiliation:
Laboratoire de Spectroscopie Atomique et Ionique, Bât 350, Université Paris-sud, 91405 Orsay, France
PH. ZEITOUN
Affiliation:
Laboratoire de Spectroscopie Atomique et Ionique, Bât 350, Université Paris-sud, 91405 Orsay, France
P. DHEZ
Affiliation:
Laboratoire de Spectroscopie Atomique et Ionique, Bât 350, Université Paris-sud, 91405 Orsay, France
M. FRANÇOIS
Affiliation:
Institut d'Electronique et de Microélectronique du Nord, Université des Sciences et Technologie de Lille, avenue Poincaré BP 69, 59652 Villeneuve d'Ascq, France
M. IDIR
Affiliation:
Laboratoire de Spectroscopie Atomique et Ionique, Bât 350, Université Paris-sud, 91405 Orsay, France
D. ROS
Affiliation:
Laboratoire de Spectroscopie Atomique et Ionique, Bât 350, Université Paris-sud, 91405 Orsay, France
A. CARILLON
Affiliation:
Laboratoire de Spectroscopie Atomique et Ionique, Bât 350, Université Paris-sud, 91405 Orsay, France
Get access Rights & Permissions [Opens in a new window]

Abstract

New fields of X-ray source applications (X-ray laser and high order harmonic generation) could appear if an intensity higher than 1012 Wcm−2 is reached. Following this goal, we have started a complete investigation of the X-ray beam wavefront both numerically and experimentally. The first XUV wavefront sensor has been developed and tested on different XUV sources. For a better comprehension of the experimental results, a numerical work (ray-trace code) has been performed. We present and discuss the first results obtained on the X-ray laser at 21.2 nm.

Type
Research Article
Information
Laser and Particle Beams , Volume 19 , Issue 1 , January 2001 , pp. 55 - 58
Copyright
© 2001 Cambridge University Press

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)