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Forevacuum plasma source of continuous electron beam

Published online by Cambridge University Press:  30 April 2019

Aleksandr Klimov ,
Ilya Bakeev Open the ORCID record for Ilya Bakeev [Opens in a new window] ,
Efim Oks  and
Aleksey Zenin
Aleksandr Klimov*
Affiliation:
Laboratory of Plasma Electronics, Tomsk State University of Control Systems and Radioelectronics, Tomsk 634050, Russia
Ilya Bakeev
Affiliation:
Laboratory of Plasma Electronics, Tomsk State University of Control Systems and Radioelectronics, Tomsk 634050, Russia
Efim Oks
Affiliation:
Laboratory of Plasma Electronics, Tomsk State University of Control Systems and Radioelectronics, Tomsk 634050, Russia Laboratory of Plasma Sources, High Current Electronics Institute, Tomsk 634055, Russia
Aleksey Zenin
Affiliation:
Laboratory of Plasma Electronics, Tomsk State University of Control Systems and Radioelectronics, Tomsk 634050, Russia
*
Author for correspondence: Aleksandr Klimov, Laboratory of Plasma Electronics, Tomsk State University of Control Systems and Radioelectronics, Tomsk 634050, Russia. E-mail: klimov@main.tusur.ru
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Abstract

We describe here the design, main parameters, and characteristics of a forevacuum-pressure plasma-cathode electron source based on a hollow-cathode discharge. The source generates a continuous focused electron beam with energy up to 30 keV and current up to 300 mA at a pressure of 10–50 Pa. The focused electron beam reaches a maximum power density of 106 W/cm2. The source utility has been demonstrated by its application for processing and cutting of ceramic.

Keywords

Dielectric treatmentelectron beamforevacuumplasma source
Type
Research Article
Information
Laser and Particle Beams , Volume 37 , Issue 2 , June 2019 , pp. 203 - 208
Copyright
Copyright © Cambridge University Press 2019 

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