Hostname: page-component-cd9895bd7-q99xh Total loading time: 0 Render date: 2024-12-27T08:08:33.882Z Has data issue: false hasContentIssue false
  • English
  • Français

Low-temperature plasmas induced in nitrogen by extreme ultraviolet (EUV) pulses

Published online by Cambridge University Press:  25 January 2018

A. Bartnik ,
W. Skrzeczanowski ,
H. Fiedorowicz ,
P. Wachulak  and
T. Fok
A. Bartnik*
Affiliation:
Institute of Optoelectronics, Military University of Technology, Kaliskiego 2, 00-908 Warsaw, Poland
W. Skrzeczanowski
Affiliation:
Institute of Optoelectronics, Military University of Technology, Kaliskiego 2, 00-908 Warsaw, Poland
H. Fiedorowicz
Affiliation:
Institute of Optoelectronics, Military University of Technology, Kaliskiego 2, 00-908 Warsaw, Poland
P. Wachulak
Affiliation:
Institute of Optoelectronics, Military University of Technology, Kaliskiego 2, 00-908 Warsaw, Poland
T. Fok
Affiliation:
Institute of Optoelectronics, Military University of Technology, Kaliskiego 2, 00-908 Warsaw, Poland
*
Author for correspondence: A. Bartnik, Institute of Optoelectronics, Military University of Technology, Kaliskiego 2, 00-908 Warsaw, Poland. E-mail: andrzej.bartnik@wat.edu.pl
Get access Rights & Permissions [Opens in a new window]

Abstract

In this work, a comparative study of low-temperature plasmas, induced in a gaseous nitrogen by photoionization of the gas using two different irradiation systems, was performed. Both systems were based on laser-produced Xe plasmas, emitting intense extreme ultraviolet (EUV) radiation pulses in a wide wavelength range. The essential difference between the systems concerned formation of the EUV beam. The first one utilized a dedicated ellipsoidal mirror for collecting and focusing of the EUV radiation. This way a high radiation fluence could be obtained for ionization of the N2 gas injected into the vacuum chamber. The second system did not contain any EUV collector. In this case, the nitrogen to be ionized was injected into the vicinity of the Xe plasma. In both cases, energies of emitted photons were sufficient for dissociative ionization, ionization of atoms or even ions. The resulting photoelectrons had also sufficiently high energy for further ionizations or excitations. Low-temperature plasmas, created this way, were investigated by spectral measurements in the EUV, ultraviolet (UV) and visible (VIS) spectral ranges. Time-resolved UV/VIS spectra, corresponding to single-charged ions, molecules, and molecular ions, were recorded. Numerical simulations of the molecular spectra were performed allowing one to estimate vibrational and rotational temperatures of plasmas created using both irradiation systems.

Keywords

Extreme ultravioletlaser-produced plasmaphotoionization
Type
Research Article
Information
Laser and Particle Beams , Volume 36 , Issue 1 , March 2018 , pp. 76 - 83
Copyright
Copyright © Cambridge University Press 2018 

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

Bartnik, A, Fiedorowicz, H, Jarocki, R, Kostecki, J, Szczurek, M and Wachulak, PW (2011) Laser-plasma EUV source dedicated for surface processing of polymers. Nuclear Instruments and Methods in Physics Research A 647, 125–131.Google Scholar
Bartnik, A, Fiedorowicz, H, Rakowski, R, Szczurek, M, Bijkerk, F, Bruijn, R and Fledderus, H (2001). Soft X-ray emission from a double stream gas puff target irradiated by a nanosecond laser pulse. Proceedings of SPIE, 2001, vol. 4424. ECLIM 2000: 26th European Conference on Laser Interaction with Matter, Milan Kálal, Karel Rohlena, 406 Milan Šinor, Editors.Google Scholar
Bartnik, A, Lisowski, W, Sobczak, J, Wachulak, P, Budner, B, Korczyc, B and Fiedorowicz, H (2012) Simultaneous treatment of polymer surface by EUV radiation and ionized nitrogen. Applied Physics A 109, 39–43.CrossRefGoogle Scholar
Bartnik, A, Wachulak, P, Fok, T, Fiedorowicz, H, Pisarczyk, T, Chodukowski, T, Kalinowska, Z, Dudzak, R, Dostal, J, Krousky, E, Skala, J, Ullschmied, J, Hrebicek, J and Medrik, T (2015) Photoionized plasmas induced in neon with extreme ultraviolet and soft X-ray pulses produced using low and high energy laser systems. Physics of Plasmas 22;4, 043302.Google Scholar
Bibinov, NK, Fateev, AA and Wiesemann, K (2001) Variations of the gas temperature in He/N2 barrier discharges. Plasma Sources, Science and Technology 10, 579–588.Google Scholar
Bogaerts, A, Neyts, E, Gijbels, R and van der Mullen, J (2002) Gas discharge plasmas and their applications. Spectrochimica Acta B 57, 609–658.Google Scholar
Camun-Aguilar, JF, Tereiro-Garcia, R and Sanchez-Uria, JE (1994) A comparative study of three microwave induced plasma sources for atomic emission spectrometry I. Excitation of mercury and its determination after on-line continuous cold vapor generation. Spectrochimica Acta B 49, 475–484.Google Scholar
Duan, Y, Li, Y, Tian, X, Zhang, H and Jin, Q (1994) Analytical performance of the microwave plasma torch in the determination of rare earth elements with optical emission spectrometry. Analytica Chimica Acta 295, 315–324.Google Scholar
Hegemann, D, Brunner, H and Oehr, C (2003) Plasma treatment of polymers for surface and adhesion improvement. Nuclear Instruments and Methods in Physics Research B, Beam Interaction with Materials and Atoms 208, 281.Google Scholar
Konuma, M. (1992) Film Deposition by Plasma Techniques. New York: Springer.Google Scholar
Korotkov, RY, Goff, T and Ricou, P (2007) Fluorination of polymethylmethacrylate with SF6 and hexafluoropropylene using dielectric barrier discharge system at atmospheric pressure. Surface & Coatings Technology 201, 7207–7215.Google Scholar
Kull, KR, Steen, ML and Fisher, ER (2005) Surface modification with nitrogen-containing plasmas to produce hydrophilic, low-fouling membranes. Journal of Membrane Science 246, 203.Google Scholar
Kumar, M and Ando, Y (2010) Chemical Vapor Deposition of Carbon Nanotubes: A Review on Growth Mechanism and Mass Production. Journal of Nanoscience and Nanotechnology 10, 3739–3758.CrossRefGoogle ScholarPubMed
Lai, JN, Sunderland, B, Xue, JM, Yan, S, Zhao, WJ, Folkard, M, Michael, BD and Wang, YG (2006) Study on hydrophilicity of polymer surfaces improved by plasma treatment. Applications of Surface Science 252, 3375.Google Scholar
Lallement, L, Gosse, C, Cardinaud, C, Peignon-Fernandez, M-C and Rhallabi, A (2010) Etching studies of silica glasses in SF6/Ar SF6/Ar inductively coupled plasmas: Implications for microfluidic devices fabrication. Journal of Vacuum Science & Technology A 28, 277.Google Scholar
Liang, F, Zhang, DX, Lei, YH, Zhang, HQ and Jin, QH (1995) Determination of Selected Noble Metals by MPT-AES Using a Pneumatic Nebulizer. Microchemical Journal 52, 181–187.Google Scholar
Lieberman, MA (1999) Plasma discharges for materials processing and display applications. In Schluter, H and Shivarova, A (eds). Advanced Technologies Based on Wave and Beam Generated Plasmas, NATO Science Series, vol. 67. Dordrecht: Kluwer, 1999, pp. 1–22.Google Scholar
Lofthus, A and Krupenie, PH (1977) The spectrum of molecular nitrogen. Journal of Physical and Chemical Reference Data 6, 113–307.Google Scholar
Manos, DM and Flamm, DL (1989). Plasma Etching: An Introduction. Academic Press: New York.Google Scholar
Ogura, K, Yamada, H, Sato, Y and Okamoto, Y (1997) Excitation temperature in high-power nitrogen microwave-induced plasma at atmospheric pressure. Applied Spectroscopy 51, 1496–1499.Google Scholar
Plank, NOV, Blauw, MA, van der Drift, EWJM and Cheung, R (2003) The etching of silicon carbide in inductively coupled SF6/O2 plasma. Journal of Physics D 36, 482–487.Google Scholar
Ralchenko, Y, Janev, RK, Kato, T, Fursa, DV, Bray, I and de Heer, FJ (2008) Electron-impact excitation and ionization cross sections for ground state and excited helium atoms. Atomic Data and Nuclear Data Tables 94, 603–622.Google Scholar
Rangel, EC, Bento, WCA, Kayama, ME, Schreiner, WH and Cruz, NC (2003) Enhancement of polymer hydrophobicity by SF6 plasma treatment and argon plasma immersion ion implantation. Surface and Interface Analysis 35, 179–183.Google Scholar
Samukawa, S and Mieno, T (1996) Pulse-time modulated plasma discharge for highly selective, highly anisotropic and charge-free etching. Plasma Sources, Science and Technology 5, 132–113.CrossRefGoogle Scholar
Tajima, S and Komvopoulos, K (2006) Effect of reactive species on surface crosslinking of plasma-treated polymers investigated by surface force microscopy. Applied Physics Letters 89, 124102.Google Scholar
Xia, Y, Liu, B, Zhong, S and Li, C (2012) X-ray photoelectron spectroscopic studies of black silicon for solar cell. Journal of Electron Spectroscopy and Related Phenomena 184, 589–592.Google Scholar
Yoshida, S, Hagiwara, K, Hasebe, T and Hotta, A (2013) Surface modification of polymers by plasma treatments for the enhancement of biocompatibility and controlled drug release. Surface & Coatings Technology 233, 99–107.Google Scholar