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Micro-patterning of Indium thin film for generation of micron and submicron particles using femtosecond laser-induced forward transfer

Published online by Cambridge University Press:  28 May 2015

Kamlesh Alti ,
Sudhanshu Dwivedi ,
Santhosh Chidangil ,
Deepak Mathur  and
Alika Khare
Kamlesh Alti*
Affiliation:
Department of Physics, Sant Gadge Baba Amravati University, Amravati, India
Sudhanshu Dwivedi
Affiliation:
Department of Atomic and Molecular Physics, Manipal University, Manipal, India
Santhosh Chidangil
Affiliation:
Department of Atomic and Molecular Physics, Manipal University, Manipal, India
Deepak Mathur
Affiliation:
Tata Institute of Fundamental Research, Mumbai, India
Alika Khare
Affiliation:
Department of Physics, Indian Institute of Technology Guwahati, Guwahati, India
*
Address correspondence and reprint requests to: Kamlesh Alti, Department of Physics, Sant Gadge Baba Amravati University, Amravati 444 602, India. E-mail: kamleshalti@sgbau.ac.in
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Abstract

This paper reports on micro-pattering of Indium thin film (donor substrate) using a higher deposition dose than previously reported. The threshold deposition dose required for micro-patterning was measured. Ejected material from the micro-patterned thin film was deposited onto an accepter substrate kept in close proximity; it clearly shows deposition of micron and submicron particles of Indium. Moreover, a clean line like structure was deposited onto the accepter substrate when the accepter substrate was moved with the same velocity as that of the donor substrate.

Keywords

Indium Thin filmLaser induced forward transferLaser micromachiningMicron and submicron particles
Type
Research Article
Information
Laser and Particle Beams , Volume 33 , Issue 3 , September 2015 , pp. 449 - 454
Copyright
Copyright © Cambridge University Press 2015 

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