Published online by Cambridge University Press: 13 January 2016
Thin-film transistors (TFT) were fabricated at a room-temperature (RT) with zincoxide (ZnO) channel and indium molybdenum oxide (IMO) electrodes. To isolate thegate oxide and gate electrode influence on the device performance, common gateconfiguration on a commercial substrate with thermal SiO2 (100 nm)was selected. A threshold voltage (V Th) of 10 V and I ON/I OFF ratio of 1 × 10-5 were obtained. Once the referencedata was taken transistors were exposed to glycerol. Temporary changes in devicecharacteristics were observed due to the influence of glycerol, a lowconductivity medium. To exclude the possibility of sugar alcohol being the mainconductor, measurement on dummy transistor electrode was performed retaining thedistance between probes. The TFT device under test revealed ten times higherdrain current but also a change in threshold voltage and leakage current.Transistors under glycerol influence were always open with the positive gatebias.