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Subwavelength Grating Structure with High Aspect Ratio and Tapered Sidewall Profiles

Published online by Cambridge University Press:  28 December 2015

W. Yu ,
D. Wu ,
X. Duan  and
Y. Yi
W. Yu
Affiliation:
University of Michigan, MI
D. Wu
Affiliation:
University of Michigan, MI
X. Duan
Affiliation:
Massachusetts Institute of Technology, Cambridge, MA
Y. Yi*
Affiliation:
University of Michigan, MI Massachusetts Institute of Technology, Cambridge, MA
*
*e-mail: yys@alum.mit.edu
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Abstract

CMOS-compatible fabrication and etching processes are often used in subwavelength grating structures manufacturing, it normally generates tapered sidewall profile of the gratings. In this work, we have studied the impacts on resonance mode characteristics of subwavelength grating structures due to the tapered sidewall profile, as well as grating with high aspect ratio. Our simulation results have revealed that both of these two factors play important roles on the resonance mode behavior of subwavelength grating devices. We also discussed the mechanism between the guided mode resonance and the grating cavity mode resonance. Our study will provide guidance for a series of integrated photonics devices applications, such as compact optical filter, photonics amplifier, and lasers, while the realistic subwavelength grating structure is considered.

Keywords

nanoscaleoptical propertiessemiconducting
Type
Articles
Information
MRS Advances , Volume 1 , Issue 23: Electronics and Photonics , 2016 , pp. 1693 - 1701
Copyright
Copyright © Materials Research Society 2015 

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References

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