Crossref Citations
This article has been cited by the following publications. This list is generated based on data provided by
Crossref.
Popovici, M.
Belmonte, A.
Oh, H.
Potoms, G.
Meersschaut, J.
Richard, O.
Hody, H.
Van Elshocht, S.
Delhougne, R.
Goux, L.
and
Kar, G. Sankar
2018.
High-performance (<tex>$\text{EOT} < 0.4\text{nm}$</tex>, Jg∼10−7 A/cm2) ALD-deposited Ru\SrTiO<inf>3</inf> stack for next generations DRAM pillar capacitor.
p.
2.7.1.
Hwang, Cheol Seong
and
Dieny, Bernard
2018.
Advanced memory—Materials for a new era of information technology.
MRS Bulletin,
Vol. 43,
Issue. 5,
p.
330.
Hsu, Wei-Heng
Bell, Roy
and
Victora, R. H.
2018.
Ultra-Low Write Energy Composite Free Layer Spin–Orbit Torque MRAM.
IEEE Transactions on Magnetics,
Vol. 54,
Issue. 11,
p.
1.
Pyeon, Jung Joon
Cho, Cheol Jin
Jeong, Doo Seok
Kim, Jin-Sang
Kang, Chong-Yun
and
Kim, Seong Keun
2018.
A Ru–Pt alloy electrode to suppress leakage currents of dynamic random-access memory capacitors.
Nanotechnology,
Vol. 29,
Issue. 45,
p.
455202.
Park, Min Hyuk
Lee, Young Hwan
Kim, Han Joon
Kim, Yu Jin
Moon, Taehwan
Kim, Keum Do
Hyun, Seung Dam
and
Hwang, Cheol Seong
2018.
Morphotropic Phase Boundary of Hf1–xZrxO2 Thin Films for Dynamic Random Access Memories.
ACS Applied Materials & Interfaces,
Vol. 10,
Issue. 49,
p.
42666.
Lee, Woongkyu
Cho, Cheol Jin
Lee, Woo Chul
Hwang, Cheol Seong
Chang, Robert P. H.
and
Kim, Seong Keun
2018.
MoO2 as a thermally stable oxide electrode for dynamic random-access memory capacitors.
Journal of Materials Chemistry C,
Vol. 6,
Issue. 48,
p.
13250.
Lee, Donghyun
Yang, Kun
Park, Ju-Yong
and
Park, Min Hyuk
2019.
Review of Electrical Characterization of Ceramic Thin Films for the Next Generation Semiconductor Devices.
Ceramist,
Vol. 22,
Issue. 4,
p.
332.
Paraskevas, Kyriakos
Attwood, Andrew
Luján, Mikel
and
Goodacre, John
2019.
Scaling the capacity of memory systems; evolution and key approaches.
p.
235.
Kim, Sang Hyeon
Lee, Woongkyu
An, Cheol Hyun
Kim, Dong‐Gun
Kwon, Dae Seon
Cho, Seong Tak
Cha, Soon Hyung
Lim, Jun Il
and
Hwang, Cheol Seong
2019.
Effect of the Annealing Temperature of the Seed Layer on the Following Main Layer in Atomic‐Layer‐Deposited SrTiO3 Thin Films.
physica status solidi (RRL) – Rapid Research Letters,
Vol. 13,
Issue. 5,
Cho, Cheol Jin
Pyeon, Jung Joon
Hwang, Cheol Seong
Kim, Jin-Sang
and
Kim, Seong Keun
2019.
Atomic layer deposition of Ta-doped SnO2 films with enhanced dopant distribution for thermally stable capacitor electrode applications.
Applied Surface Science,
Vol. 497,
Issue. ,
p.
143804.
Park, Min Hyuk
and
Hwang, Cheol Seong
2019.
Fluorite-structure antiferroelectrics.
Reports on Progress in Physics,
Vol. 82,
Issue. 12,
p.
124502.
Lee, Seung Won
Kim, Chang-Min
Choi, Jeong-Hun
Hyun, Cheol-Min
and
Ahn, Ji-Hoon
2019.
Modulation of crystal structure and electrical properties of Hf0.6Zr0.4O2 thin films by Al-doping.
Materials Letters,
Vol. 252,
Issue. ,
p.
56.
Kozodaev, M. G.
Lebedinskii, Y. Y.
Chernikova, A. G.
Korostylev, E. V.
Chouprik, A. A.
Khakimov, R. R.
Markeev, Andrey M.
and
Hwang, C. S.
2019.
Temperature controlled Ru and RuO2 growth via O* radical-enhanced atomic layer deposition with Ru(EtCp)2.
The Journal of Chemical Physics,
Vol. 151,
Issue. 20,
Han, Jin-Woo
Kim, Jungsik
Moon, Dong-Il
Lee, Jeong-Soo
and
Meyyappan, M.
2019.
Soft Error in Saddle Fin Based DRAM.
IEEE Electron Device Letters,
Vol. 40,
Issue. 4,
p.
494.
Bon, Chris Yeajoon
Kim, Dami
Lee, Kanghyuk
Choi, Sungjoon
Park, Insung
and
Yoo, Sang-Im
2020.
Enhanced electrical properties of Nb-doped a-HfO2 dielectric films for MIM capacitors.
AIP Advances,
Vol. 10,
Issue. 11,
Raza Ansari, Md. Hasan
Yoon Lee, Jae
Cho, Seongjae
and
Park, Byung-Gook
2020.
Design and Analysis of Core-Gate Shell-Chanel 1T DRAM.
p.
25.
Lee, Woo Chul
Kim, Sangtae
Larsen, Eric S.
Choi, Jung-Hae
Baek, Seung-Hyub
Lee, Minji
Cho, Deok-Yong
Lee, Han-Koo
Hwang, Cheol Seong
Bielawski, Christopher W.
and
Kim, Seong Keun
2020.
Atomic engineering of metastable BeO6 octahedra in a rocksalt framework.
Applied Surface Science,
Vol. 501,
Issue. ,
p.
144280.
Das, Dipjyoti
and
Jeon, Sanghun
2020.
High-k HfxZr1-xO₂ Ferroelectric Insulator by Utilizing High Pressure Anneal.
IEEE Transactions on Electron Devices,
Vol. 67,
Issue. 6,
p.
2489.
Hyun, Seung Dam
Park, Hyeon Woo
Park, Min Hyuk
Lee, Young Hwan
Lee, Yong Bin
Kim, Beom Yong
Kim, Ho Hyun
Kim, Baek Su
and
Hwang, Cheol Seong
2020.
Field‐Induced Ferroelectric Hf1‐xZrxO2 Thin Films for High‐k Dynamic Random Access Memory.
Advanced Electronic Materials,
Vol. 6,
Issue. 11,
Spessot, Alessio
and
Oh, Hyungrock
2020.
1T-1C Dynamic Random Access Memory Status, Challenges, and Prospects.
IEEE Transactions on Electron Devices,
Vol. 67,
Issue. 4,
p.
1382.