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In situ FIB-SEM characterization and manipulation methods

Published online by Cambridge University Press:  09 April 2014

Nicholas Antoniou ,
Konrad Rykaczewski  and
Michael D. Uchic
Nicholas Antoniou
Affiliation:
Center for Nanoscale Systems, Harvard University; Nicholas@cns.fas.harvard.edu
Konrad Rykaczewski
Affiliation:
School for Engineering of Matter, Transport, and Energy, Arizona State University; konradr@asu.edu
Michael D. Uchic
Affiliation:
Air Force Research Laboratory, Wright Patterson AFB; michael.uchic@us.af.mil
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Abstract

This article reviews recent developments and applications of two beam systems (focused ion beam [FIB] and scanning electron microscope [SEM]) for in situ characterization and manipulation of material at the micro- and nanoscale. In these applications, the sample may be manipulated, ion milled, mechanically or electrically excited, and its temperature varied from above room temperature to cryogenic levels. FIB-SEM instruments offer new opportunities for in situ characterization by enabling localized exposure of surface layers within the high vacuum microscope chamber environment (especially in conjunction with cryogenic cooling of the bulk sample), through experiments that require either highly accurate material removal or localized material addition through beam-induced gas deposition, and by using micro- and nano-manipulation technologies for probing or positioning. This article describes the current state of the art of this experimental methodology and provides case studies in the areas of cryogenic, electrical, and mechanical characterization.

Keywords

ion-beam processingScanning electron microscopy (SEM)ion-beam assisted deposition
Type
Research Article
Information
MRS Bulletin , Volume 39 , Issue 4: Focused Ion Beam Technology and Applications , April 2014 , pp. 347 - 352
Copyright
Copyright © Materials Research Society 2014 

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