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MEMS/NEMS based on mono-, nano-, and ultrananocrystalline diamond films

Published online by Cambridge University Press:  12 June 2014

Anirudha V. Sumant ,
Orlando Auciello ,
Meiyong Liao  and
Oliver A. Williams
Anirudha V. Sumant
Affiliation:
Argonne National Laboratory, IL, USA; sumant@anl.gov
Orlando Auciello
Affiliation:
University of Texas at Dallas, USA; orlando.auciello@utdallas.edu
Meiyong Liao
Affiliation:
National Institute for Materials Science, Japan; meiyong.liao@nims.go.jp
Oliver A. Williams
Affiliation:
School of Physics and Astronomy, Cardiff University, UK; williamso@cf.ac.uk
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Abstract

Diamond, because of its unique physical, chemical, and electrical properties and the feasibility of growing it in thin-film form, is an ideal choice as a material for the fabrication of reliable, long endurance, microelectromechanical/nanoelectromechanical systems (MEMS/NEMS). However, various practical challenges, including wafer-scale thickness uniformity, CMOS compatibility, surface micromachining, and, more importantly, controlling the internal stress of the diamond films, make this material more challenging for MEMS engineers. Recent advances in the growth of diamond films using chemical vapor deposition have changed this landscape since most technical hurdles have been overcome, enabling a new era of diamond-based MEMS and NEMS development. This article discusses a few examples of MEMS and NEMS devices that have been fabricated using mono-, nano-, and ultrananocrystalline diamond films as well as their performance.

Keywords

chemical vapor deposition (CVD) (chemical reaction)nanostructureinternal frictionmicroelectro-mechanical (MEMS)electronic material
Type
Research Article
Information
MRS Bulletin , Volume 39 , Issue 6: CVD Diamond—Research, Applications, and Challenges , June 2014 , pp. 511 - 516
Copyright
Copyright © Materials Research Society 2014 

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