Hostname: page-component-78c5997874-ndw9j Total loading time: 0 Render date: 2024-11-15T04:43:12.564Z Has data issue: false hasContentIssue false

The Microstructure of Metalorganic-Chemical-Vapor-Deposition GaN on Sapphire

Published online by Cambridge University Press:  29 November 2013

Get access

Extract

The group-III-N materials (GaN and its related alloys, InGaN and AlGaN) are a rapidly emerging family of compound semiconductors that have great potential for a wide range of optoelectronics and electronics applications.

GaN-based blue light-emitting diodes (LEDs) are commercially available and can already be found in full-color, billboard-size displays in major cities in Japan. Achievement of continuous-wave (cw) laser operation at blue wavelengths will lead to the commercialization of these coherent sources probably within the next few years. Like other semiconductor lasers, these devices can be manufactured relatively cheaply (eventually for a few dollars), and they are expected to replace current ($1,000 and up) ultraviolet and blue-laser sources in medical spectroscopy, high-density information storage, and in projection displays.

This article reviews the key role of the crystal structure of GaN grown on sapphire, which is currently the most widely used substrate. We trace the origin of this crystal structure from nucleation and show how it evolves as growth proceeds. We show that the final GaN film is an ordered polycrystal (rather than a single crystal), in which the individual grains are of high crystalline quality but are “tilted” and “twisted” with respect to one another. We conclude by speculating on how this microstructure may explain the unusual optical and electrical properties of GaN.

Type
Compositional Modulation and Ordering in Semiconductors
Copyright
Copyright © Materials Research Society 1997

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

1.Nakamura, S., Senoh, M., Iwasa, N., Nagahama, S., Yamada, T., and Mukai, T., Jpn. J. Appl. Phys. 34 (1995) p. L1332.CrossRefGoogle Scholar
2.Nakamura, S., Senoh, M., Nagahama, S., Iwasa, N., Yamada, T., Matsushita, T., and Sugimoto, Y., presented at Symposium N, Materials Research Society, Boston, December 2–6, 1996.Google Scholar
3.Huff, H. and Shimura, F., Solid State Technol., (1983) p. 103.Google Scholar
4.Petroff, P. and Hartman, R.L., Appl. Phys. Lett. 25 (1973) p. 226.CrossRefGoogle Scholar
5.Hiramatsu, K., Itoh, S., Amano, H., Akasaki, I., Kuwano, N., Shiraishi, T., and Oki, K., J. Cryst. Growth 115 (1991) p. 628.CrossRefGoogle Scholar
6.Powell, R.C., Lee, N.E., Kim, Y.W., and Greene, K.E., J. Appl. Phys. 73 (1993) p. 189.CrossRefGoogle Scholar
7.Chadda, S., Pekynski, M., Malloy, K., and Hersee, S.D., in Growth, Processing, and Characterization of Semiconductor Heterostructures, edited by Gumbs, G., Luryi, S., Weiss, B., and Wicks, G.W. (Mater. Res. Soc. Symp. Proc. 326, Pittsburgh, 1994) p. 353.Google Scholar
8.Qian, W., Skowronski, M., De Graef, M., Doverspike, K., Rowland, L.B., and Gaskill, D.K., Appl. Phys. Lett. 66 (1995) p. 1252.CrossRefGoogle Scholar
9.Ponce, F.A., Krusor, B.S., Major, J.S. Jr., Piano, W.E., and Welch, D.F., Appl. Phys. Lett. 67 (1995) p. 410.CrossRefGoogle Scholar
10.Nakamura, S., Jpn. J. Appl. Phys. 30 (1991) p. L1705.CrossRefGoogle Scholar
11.Vook, R.W., SPIE 346 (1982).Google Scholar
12. For example, see Ohring, M., The Materials Science of Thin Films (Academic Press, Inc., San Diego, 1992).Google Scholar
13.Wickenden, A.E., Wickenden, D.K., and Kistenmacher, T.J., J. Appl. Phys. 75 (1994) p. 5367.CrossRefGoogle Scholar
14.Hersee, S.D., Ramer, J., Zheng, K., Kranenberg, C.F., Malloy, K., Banas, M., and Goorsky, M., J. Electron. Mater. 24 (1995) p. 1519.CrossRefGoogle Scholar
15.Ponce, F., Workshop on Wide-Gap Nitrides (St. Louis, October, 1994).Google Scholar
16.Heying, B., Wu, X.H., Keller, S., Li, Y., Kapolnek, D., Keller, B.P., DenBaars, S.P., and Speck, J.S., Appl. Phys. Lett. 68 (1996) p. 643.CrossRefGoogle Scholar
17.Kim, D.M., Khondker, A.N., Ahmed, S.S., and Shah, R.R., IEEE Trans. Electron Devices ED31 (1984) p. 480.CrossRefGoogle Scholar
18.Ponce, F.A., Bour, D.P., Gotz, W., and Wright, P.J., Appl Phys. Lett. 68 (1996) p. 57.CrossRefGoogle Scholar