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Surface modification and fabrication of 3D nanostructures by atomic layer deposition

Published online by Cambridge University Press:  18 November 2011

Changdeuck Bae ,
Hyunjung Shin  and
Kornelius Nielsch
Changdeuck Bae
Affiliation:
Institute of Applied Physics, University of Hamburg, Germany; cdbae@physnet.uni-hamburg.de
Hyunjung Shin
Affiliation:
Kookmin University, Seoul, Korea; hjshin@kmu.kookmin.ac.kr
Kornelius Nielsch
Affiliation:
University of Hamburg, Germany; knielsch@physnet.uni-hamburg.de
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Abstract

Atomic layer deposition (ALD) not only presents a direct way to prepare nanomaterials when combined with templates, but also allows surface engineering to fine-tune the properties of the material. Here, we review recent progress in the field of nanostructured materials and devices that have been fabricated by ALD. Various materials, including semiconducting, magnetic, noble metallic, and insulating materials, can be used to form three-dimensional (3D), complex nanostructures with controlled composition and physical properties. We begin this review with ALD nanomaterials that can be prepared from porous templates with a 2D pore arrangement, such as anodic aluminum oxide, and advance toward opal structures with a 3D pore arrangement. We also discuss surface engineering by ALD on existing nanowires/nanotubes, devices, and chemical patterns that has the potential for application in high-performance transistors, sensors, and green energy conversion. Finally, we provide perspectives for future device applications that could arise from ALD nanomaterials.

Keywords

Atomic layer depositionthin filmnanostructure
Type
Research Article
Information
MRS Bulletin , Volume 36 , Issue 11: Progress and future directions for atomic layer deposition and ALD-based chemistry , November 2011 , pp. 887 - 897
Copyright
Copyright © Materials Research Society 2011

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