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Characterization of Electroplated Copper Films with Laser-Generated Surface Acoustic Waves

Published online by Cambridge University Press:  01 February 2011

A.A. Maznev
Affiliation:
Philips Advanced Metrology Systems, 12 Michigan Dr., Natick MA 01760, U.S.A.
M. Gostein
Affiliation:
Philips Advanced Metrology Systems, 12 Michigan Dr., Natick MA 01760, U.S.A.
S.H. Brongersma
Affiliation:
IMEC, Kapeldreef 75, B-3001, Leuven, Belgium
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Abstract

Elastic properties of electroplated copper films fabricated under different plating and annealing conditions have been characterized with laser-generated surface acoustic waves. For acoustic wavelengths longer than the characteristic copper grain size, the effective elastic modulus of copper was found to be unaffected by variations of the plating current as well as by the grain size variation due to different annealing temperatures. Consequently, copper thickness measurements with surface acoustic waves have been found to be more stable with respect to process variations than electrical sheet resistance measurements. For short acoustic wavelengths (∼ 2 νm), grain growth results in a significant increase of acoustic attenuation and a shift in the measured velocity. This finding opens an opportunity for copper structure monitoring by surface wave-based optoacoustic metrology.

Type
Research Article
Copyright
Copyright © Materials Research Society 2003

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References

1. Lingk, C., Gross, M.E., and Brown, W.L., J. Appl. Phys. 87, 2232 (2000).Google Scholar
2. Brongersma, S.H., Kerr, E., Vervoort, I., Saerens, A. and Maex, K., J. Mater. Res. 17, 582 (2002).Google Scholar
3. Rogers, J.A., Maznev, A.A., Banet, M.J. and Nelson, K.A., Annu. Rev. Mater. Sci. 30 (117) 2000.Google Scholar
4. Nelsen, D., Gostein, M., and Maznev, A., in Proc. 9th Symposium on Polymers for Microelectronics, Wilmington, Delaware, May 2000.Google Scholar
5. Gostein, M., Banet, M., Joffe, M.A., Maznev, A.A., Sacco, R., Rogers, J.A. and Nelson, K.A., in Handbook of Silicon Semiconductor Metrology, ed. Diebold, A.C. (Marcel Dekker, 2001), pp.167196.Google Scholar
6. Kaganova, I.M. and Maradudin, A.A., Physica Scripta T44 (104) 1992.Google Scholar