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Characterization Of Physically Vapor Deposited Af2400 Thin Films

Published online by Cambridge University Press:  16 February 2011

R. Chow
Affiliation:
Lawrence Livermore National Laboratory, P. O. Box 808, Livermore, CA, 94551
M. K. Spragge
Affiliation:
Lawrence Livermore National Laboratory, P. O. Box 808, Livermore, CA, 94551
G. E. Loomis
Affiliation:
Lawrence Livermore National Laboratory, P. O. Box 808, Livermore, CA, 94551
F. Rainer
Affiliation:
Lawrence Livermore National Laboratory, P. O. Box 808, Livermore, CA, 94551
R. L. Ward
Affiliation:
Lawrence Livermore National Laboratory, P. O. Box 808, Livermore, CA, 94551
I. M. Thomas
Affiliation:
Lawrence Livermore National Laboratory, P. O. Box 808, Livermore, CA, 94551
M. R. Kozlowski
Affiliation:
Lawrence Livermore National Laboratory, P. O. Box 808, Livermore, CA, 94551
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Abstract

Anti-reflective optical coatings made with Teflon AF2400 had the highest laser damage thresholds recorded for physical vapor deposited coatings at the Lawrence Livermore National Laboratory damage facility. Physical vapor deposited layers of Teflon AF2400, a perfluorinated amorphous polymer, Maintained the bulk optical properties of a high transmittance from 200 nm to 1200 nm, and a low refractive index. In addition, the refractive index can be intentionally reduced by control of two common deposition parameters, deposition rate and substrate temperature. Scanning electron microscopy and nuclear magnetic resonance observations indicated that morphological changes caused the variations in the refractive index rather than compositional changes. The coatings adhered to fused silica and silicon wafers under normal laboratory handling conditions.

Type
Research Article
Copyright
Copyright © Materials Research Society 1994

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