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A Chemical Study of Photo-CVD of Silicon Nitride in Mercury-Sensitized Reactions Between Silane and Ammonia

Published online by Cambridge University Press:  26 February 2011

Ching-Hsong Wu
Ching-Hsong Wu*
Affiliation:
Research Staff, Ford Motor Co., P. O. Box 2053, Dearborn, MI 48121
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Abstract

A photochemical system of mercury-sensitized reactions between silane and ammonia was studied to elucidate the gas-phase chemical processes involved in photo-CVD of silicon nitride. Several transient intermediates were detected and identified as silylated amines by the mass spectrometric isotope labeling method. These compounds containing both Si and N atoms appeared to be the precursors of silicon nitride. The chemical characteristics of silylated amines were studied under different experimental conditions. The reactivity and possible reaction paths for the formation of silylamine are discussed.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 101: Symposium B – Laser and Particle-Beam Chemical Processing for Microelectronics , 1987 , 373
Copyright
Copyright © Materials Research Society 1998

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References

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