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The Contribution of Beam Processing to Present and Future Integrated Circuit Technologies

Published online by Cambridge University Press:  15 February 2011

C Hill
C Hill*
Affiliation:
Plessey Research (Caswell) Ltd., Allen Clark Research Centre, Caswell, Towcester, Northants. NN12 8EQ, England
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Abstract

A brief history and present state of beam processing techniques and applications to silicon integrated circuit technology are given. The viability of incorporating pulse-laser controlled doping profiles into the emitter-base structure of an advanced bipolar transistor is discussed. The areas of present I.C. technology which will constrain future device development are identified, and the contribution that beam processing can make in removing these constraints is discussed. The beam processing techniques most likely to be found in future I.C. technologies are described.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 13 , 1982 , 381
Copyright
Copyright © Materials Research Society 1983

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References

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