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The Crystalline-To-Amorphous Phase Transition In Irradiated Silicon
Published online by Cambridge University Press: 26 February 2011
Abstract
The amorphous(a)-to-crystalline (c) phase transition has been studied in electron(e-) and/or ion irradiated silicon (Si). The irradiations were performed in i n the Argonne High Voltage Microscope-Tandem Facility The irradia ion of Si, at <10 K, with 1-MeV e- to a fluence of 14 dpa failed to induce the c-to-a transition. Whereas an irradiation, at <10 K, with 1.0 or 1.5-MeV Kr+ ions induced the c-to-a transition by a fluence of ≈0.37 dpa. Alternatively a dual irradiation, at 10 K, with 1.0-MeV e and 1.0 or 1.5-MeV Kr+ to a Kr+ fluence of 1.5 dpa -- where the ratio of the displacement rates for e- to ions was ≈0.5--resulted in the Si specimen retaining a degree of crystallinity. These results are discussed in terms of the degree of dispersion of point defects in the primary state of radiation damage and the mobilities of point defects.
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- Copyright © Materials Research Society 1985
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