Published online by Cambridge University Press: 01 January 1992
A transmission electron microscopy study of the defect structure in Czochralski single crystals of V3Si is presented. As grown crystals contain occasional V5Si3 precipitates and a low density of edge dislocations with b = a<100>. Following deformation to 4% strain at 1600°C in compression much higher densities of precipitates and screw dislocations are present. Images of the dislocations are doubled under certain conditions and it is suggested that this corresponds to a dissociation of the form; a<100> ∭ a/2<100> + CSF + a/2<100>, as observed previously in Nb3Al. The significance of this dissociation for deformation mechanisms in V3Si is discussed.