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Electron Beam Processing for Spin-on Polymers and its Applications to Back-End-of-Line (BEOL) Integration

Published online by Cambridge University Press:  10 February 2011

J. J. Yang ,
J. Gill ,
J. Kennedy ,
S.-Q. Wang ,
L. Forester  and
M. Ross
J. J. Yang
Affiliation:
AlliedSignal Inc., Advanced Microelectronics Materials, 1349 Moffett Park Drive, Sunnyvale, CA 94089
J. Gill
Affiliation:
AlliedSignal Inc., Advanced Microelectronics Materials, 1349 Moffett Park Drive, Sunnyvale, CA 94089
J. Kennedy
Affiliation:
AlliedSignal Inc., Advanced Microelectronics Materials, 1349 Moffett Park Drive, Sunnyvale, CA 94089
S.-Q. Wang
Affiliation:
AlliedSignal Inc., Advanced Microelectronics Materials, 1349 Moffett Park Drive, Sunnyvale, CA 94089
L. Forester
Affiliation:
AlliedSignal Inc., Advanced Microelectronics Materials, 1349 Moffett Park Drive, Sunnyvale, CA 94089
M. Ross
Affiliation:
AlliedSignal Inc., Electron Vision, 10119 Carroll Canyon Road, San Diego, CA 92131
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Abstract

The versatility of e-beam processing provides the capability of tailoring the properties of spin-on polymers. Using different e-beam processing schemes, one can obtain a variety of films such as a homogeneous film with modified properties from the original, a film with variable properties as a function of depth, or a film having two distinct layers. In this paper, we demonstrated how to utilize this advantage of e-beam process to facilitate integration of spin-on polymers in the back-end-of-line manufacturing.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 511: Symposium E – Low Dielectric Constant Materials IV , 1998 , 49
Copyright
Copyright © Materials Research Society 1998

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