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Evolution of Surface Roughness During CVD Growth

Published online by Cambridge University Press:  15 February 2011

E. Chason ,
T.M. Mayer ,
D.P. Adams ,
H. Huang ,
T. Diaz De La Rubia ,
G. Gilmer  and
B. K. Kellerman
E. Chason
Affiliation:
Sandia National Laboratories, Albuquerque, NM
T.M. Mayer
Affiliation:
Sandia National Laboratories, Albuquerque, NM
D.P. Adams
Affiliation:
Sandia National Laboratories, Albuquerque, NM
H. Huang
Affiliation:
Lawrence Livermore National Laboratory, Livermore, CA
T. Diaz De La Rubia
Affiliation:
Lawrence Livermore National Laboratory, Livermore, CA
G. Gilmer
Affiliation:
Lucent Technologies, Murray Hill, NJ
B. K. Kellerman
Affiliation:
MEMC Electronic Materials, St. Peters, MO
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Abstract

Monte Carlo simulations of physical and chemical vapor deposition are used to study roughening kinetics of films that grow by nucleation and coalescence of clusters. The effects of interlayer transport, preferential dissociation of molecular precursors and energetic differences between the clusters and the substrate are examined.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 440: Symposia CA – Structure and Evolution of Surfaces , 1996 , 157
Copyright
Copyright © Materials Research Society 1997

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References

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3. Adams, D.P., Mayer, T.M., Chason, E., Kellerman, B.K. and Swartzentruber, B.S., Surf. Sci., in press.Google Scholar
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