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Field Emission Site Densities of Nanostructured Carbon

Published online by Cambridge University Press:  21 March 2011

J B Cui ,
J Robertson  and
W I Milne
J B Cui
Affiliation:
Department of Engineering, Cambridge University, Cambridge CB2 1PZ, UK
J Robertson
Affiliation:
Department of Engineering, Cambridge University, Cambridge CB2 1PZ, UK
W I Milne
Affiliation:
Department of Engineering, Cambridge University, Cambridge CB2 1PZ, UK
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Abstract

The field emission properties of nanostructured carbon films deposited by cathodic vacuum arc in a He atmosphere have been studied by measuring the emission currents and the emission site density. The films have an onset field of ∼3 V/μm. The emission site density is viewed on a phosphor anode and it increases rapidly with applied field. It is assumed that the emission occurs from surface regions with a range of field enhancement factors but with a constant work function. The field enhancement factor is found to have an exponential distribution.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 675: Symposium W – Nanotubes, Fullerenes, Nanostructured and Disordered Carbon , 2001 , W6.5.1
Copyright
Copyright © Materials Research Society 2001

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References

REFERENCES

1. Xu, N.S., Latham, R.V., Tzeng, Y., Electron. Lett. 29, 1596 (1993).Google Scholar
2. Talin, A. A., Pan, L. S., McCarty, K. F., Felter, T. E., Appl. Phys. Lett. 69, 3842 (1996).Google Scholar
3. Lacher, F, Wild, C, Behr, D, Koidl, P, Diamond Related Mats 6 1111 (1997)Google Scholar
4. Zhou, D., Krauss, A.R., Gruen, D.M., J. Appl. Phys. 83, 4546 (1997).Google Scholar
5. Zhu, W., Kochanski, G.P., Jin, S., Science 282, 1471 (1998).Google Scholar
6. Dean, K. A. and Chalamala, B. R., Appl. Phys. Lett. 76, 375 (1999).Google Scholar
7. Zhu, W, Bower, C, Zhou, O, Kochanski, G, Jin, S, App Phys Lett 75 873 (1999)Google Scholar
8. Groning, O, Kuttel, O M, Emmenegger, C, Groning, P, Schlapbach, L, J Vac Sci Technol B 18 665 (2000).Google Scholar
9. Nilsson, L, Groning, O, Emmenegger, C, Kuttel, O, Schaller, E, Schlapbach, L, Kind, H, Bonard, J M, Kern, K, App Phys Lett 76 2071 (2000)Google Scholar
10. Merkulov, V I, Lowdnes, D H, Baylor, L R, J App Phys 89 1933 (2001)Google Scholar
11. Bonard, J M, Weiss, N, Kind, H, Stockli, T, Forro, L, Kern, K, Chatelain, A, Advanced Mats 13 184 (2000)Google Scholar
12. Bonard, J M, Kind, H, Stockli, T, Nillson, L O, Solid State Electronics (2001)Google Scholar
13. Coll, B. F., Jaskie, J.E., Markham, J.L., Menu, E.P., Talin, A.A., and von Allmen, P., Mater. Res. Soc. Symp. Proc. 498, 185 (1998).Google Scholar
14. Merkulov, V I, Lowndes, D H, Baylor, L R, App Phys Lett 75 1228 (1999)Google Scholar
15. Satyanarayana, B S, Robertson, J, Milne, W I, J App Phys 87 3126 (2000)Google Scholar
16. Ilie, A, Hart, A, Flewitt, A J, Robertson, J., Milne, W I, J App Phys 88 6002 (2000)Google Scholar
17. Obratztsov, A N, Pavlovsky, I Y, Volkov, A P, J Vac Sci Technol B 17 674 (1999)Google Scholar
18. Satyanaryana, B.S., Hart, A., Milne, W.I., and Robertson, J., Appl. Phys. Lett. 71, 1430 (1997).Google Scholar
19. Hart, A, Satyanarayana, B.S., Milne, W. I., and Robertson, J., Appl. Phys. Lett. 74, 1594 (1999).Google Scholar
20. Talin, A A, in ‘Amorphous Carbon, State of Art’, ed Silva, S R P et al, (World Scientific, Singapore, 1998)Google Scholar
21. Milani, P, Iannotta, S, ‘Cluster beam synthesis of nano-structured materials', (Springer, Berlin, 1999)Google Scholar
22. Cui, J.B., Robertson, J., and Milne, W.I., J App Phys 89 3490 (2001).Google Scholar
23. Ghis, A, Meyer, R, Raumbaud, P, Levy, F, Leroux, T, IEEE Trans ED 38 2520 (1991)Google Scholar
24. Robertson, J, J Vac Sci Technol B 17 659 (1999), Mat Res Soc Symp Proc 621 xxx (2000)Google Scholar
25. Cui, J. B., Ristein, J., Stammler, M., Janischwosky, K., Kleber, G., and Ley, L., Diamond Rel. Mater. 9, 1143 (2000)Google Scholar
26. Schlesser, R., McClure, M.T., Choi, W.B., Hren, J.J., and Sitar, Z., Appl. Phys. Lett. 70, 1596 (1997).Google Scholar
27. Ilie, A., Ferrari, A. C., Yagi, T., Robertson, J., J App Phys (Aug 1, 2001)Google Scholar
28. Levine, J. D., J. Vac. Sci. Technol. B 13 553 (1994).Google Scholar