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Growth and Electrochemical Characterization of Single Phase MoxN Films for the Fabrication of Hybrid Double Layer Capacitors
Published online by Cambridge University Press: 10 February 2011
Abstract
The electrochemical stability and capacitance in H2SO4, KOH, and propylene carbonate of single phase polycrystalline γ-Mo2N and δMoN thin film electrodes deposited at 350 and 700° C, respectively, at a rate of 0.5 μm/min on Ti substrates have been determined. The films were prepared by chemical vapor deposition at 100 torr using Mo(CO)6 and NH3 flowing at 1.5 standard liters per minute (slm). Cyclic voltammetry referenced to a standard Ag/AgCl electrode indicated that both phases possessed a more positive voltage stability limit in H2SO4 than KOH. Films of γ-Mo2N had voltage stability ranges of -0.3 to 0.6 V and -1.3 to - 0.3 V in 4.4 M H2SO4 and 7.6 M KOH, respectively. Films of δ-MoN possessed voltage stability ranges of -0.3 to 0.7 V and -1.3 to -0.3 V in the same respective electrolytes. Both phases had a voltage stability of approximately one volt in the propylene carbonate electrolyte. These results were used to design and fabricate a hybrid capacitor composed of a Ta/Ta2O5 anode and a δ-MoN cathode contained in an electrolyte of 4.4M H2SO4. The hybrid device had an operating voltage range between 0 and 50 V, a temperature range of -55 to + 90°C, a capacitance of ≈ 5.0 mF and an energy density of ≈ 1.32 J/cm3. This device is now in pre-production at Evans Capacitor Corporation.
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- Copyright © Materials Research Society 1998
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