Hostname: page-component-78c5997874-lj6df Total loading time: 0 Render date: 2024-11-10T11:48:15.934Z Has data issue: false hasContentIssue false
  • English
  • Français

High-Rate PECVD of Low Defect Density a-Si:H on Large Areas

Published online by Cambridge University Press:  15 February 2011

S. Röhlecke ,
O. Steinke ,
F. Schade ,
F. Stahr ,
M. Albert ,
R. Deltschew ,
A. Kottwitz  and
R. Carius
S. Röhlecke
Affiliation:
FAP GmbH Dresden, Gostritzer Str. 61–63, Dresden, D-01217, Germany
O. Steinke
Affiliation:
FAP GmbH Dresden, Gostritzer Str. 61–63, Dresden, D-01217, Germany
F. Schade
Affiliation:
FAP GmbH Dresden, Gostritzer Str. 61–63, Dresden, D-01217, Germany
F. Stahr
Affiliation:
Dresden University of Technology, Semiconductor and Microsystems Technology Laboratory, Mommsenstr. 13, Dresden, D-01062, Germany
M. Albert
Affiliation:
Dresden University of Technology, Semiconductor and Microsystems Technology Laboratory, Mommsenstr. 13, Dresden, D-01062, Germany
R. Deltschew
Affiliation:
Dresden University of Technology, Semiconductor and Microsystems Technology Laboratory, Mommsenstr. 13, Dresden, D-01062, Germany
A. Kottwitz
Affiliation:
Dresden University of Technology, Semiconductor and Microsystems Technology Laboratory, Mommsenstr. 13, Dresden, D-01062, Germany
R. Carius
Affiliation:
Forschungszentrum Jülich GmbH, ISI, Jiilich, D-52425, Germany
Get access

Abstract

Industrial production of amorphous silicon solar cells, photoreceptors and several opto-electronic devices requires large area, high-deposition-rate plasma reactors and deposition processes. Non-uniformity of die film thickness and particle generation at high power densities as well as the deposition rate are found to be important limiting factors in large area PECVD.

The deposition was performed in a capacitively-coupled coaxial diode rf glow discharge with large areas (1000 cm2 and 2000 cm2) at 13.56 MHz and 27.12 MHz. We studied the particle generation in the plasma reactor over a wide range of silane concentration (20 % to 100 %) in the SiH4/He mixture. We will present the opto-electronic properties of a-Si:H films and the influence of the substrate bias. The films are characterized by dark- and photoconductivity and by PDS.

It was confirmed through this study that helium dilution is effective in the suppression of powder growth for high-rate deposition up to 18 μm/hr. Special attention was paid to the optimization of reactor design and plasma conditions for the deposition of low density of states a-Si:H (∼1016 cm−3) at deposition rates of up to 18 μm/hr. Darkconductivity was 10−9 S/cm and photoconductivity was about 5.10−4 S/cm.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 467: Symposium A – Amorphous and Microcrystalline Silicon Technology - 1997 , 1997 , 579
Copyright
Copyright © Materials Research Society 1997

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

REFERENCES

1. Strasser, G., Schmitt, J. and Bader, M., Solid State Technology, June 1994. 83–86.Google Scholar
2. Wakagi, M., Tamahashi, K. and Hanazono, M., J. Non-Cryst. Solids, 115 (1989), 207–209.Google Scholar
3. Perrin, J. and Schmitt, J., 11th E.C. Photovoltaic Solar Energy Conf., Montreux, Oct. 1992, 80–83.Google Scholar
4. Shah, A., Dutta, J., Wyrsch, N., Prasad, K., Curtins, H., Finger, F., Howling, A. and Hollenstein, Ch., Mat. Res. Soc. Symp. Proc., Vol. 258 (1992), 15–26.Google Scholar
5. Röhlecke, S., Tews, R., Kottwitz, A. and Schade, K., Surface and Coat. Technol. 74–75 (1995), 259–263.Google Scholar
6. Albert, M., Deltschew, R., Röhlecke, S. and Kottwitz, A., europhysics conference abstracts, Vol. 20 E, ESCAMPIG 1996. 25–26.Google Scholar
7. Nakamura, Y., Yamaguchi, T. and Kutsuwada, N., IS&T's Tenth International Congress on Advances in Non-Impact Printing Technologies (1994), 283–285.Google Scholar
8. Roca i Cabarrocas, P., Vanderhaghen, R., Theye, M. L., Mencaraglia, D., Djebbour, Z., Sib, J., Kleider, J.P., Longeaud, C. and Glodt, O., 10th European Photovoltaic Solar Energy Conf., Lisbon, April 1991, 1083–1086.Google Scholar
9. Roca i Cabarrocas, P., Bouizem, Y. and Theye, M. L., Philosophical Magazine B, 65 (1992), 1025–1040.Google Scholar
10. Lutz, M., Dreihöfer, S., Schade, K., Röhlecke, S., Kottwitz, A. and Stahr, F., IS&T's NIP 12, International Congress on Advances in Non-Impact Printing Technologies (1996), 451–456.Google Scholar
11. Howling, A. A., Dorier, J.-L. and Hollenstein, Ch., J. Vac. Sci. Technol. A 10 (4), 1080–1085 (1992).Google Scholar
12. Seeböck, R. J., Böhme, W., Köhler, W. E., Römheld, M. and Veprek, S., Plasma Sources Sci. Technol. 3 (1994), 359–368.Google Scholar
13. Deltschew, R., PhD thesis, Dresden University of Technology, 1991.Google Scholar
14. Jackson, W. B., Biegelsen, D. K., Nemanich, R. J. and Knights, J. C., Appl. Phys. Lett. 42 (1983), 105–107.Google Scholar
15. Wyrsch, N., Finger, F., McMahon, T. J., Vanecek, M., J. Non-Cryst. Solids, 137&138 (1991), 347–350.Google Scholar