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Impact on Thin Film Silicon Properties and Solar Cell Parameters of Texture Generated by LaserAnnealing and Chemical Etching of ZnO:Al

Published online by Cambridge University Press:  07 August 2013

Rym Boukhicha ,
Erik Johnson ,
D. Daineka ,
Antoine Michel ,
J.F. Lerat ,
Thierry Emeraud  and
Pere Roca i Cabarrocas
Rym Boukhicha
Affiliation:
CNRS, LPICM, Ecole Polytechnique, 91128 Palaiseau, France
Erik Johnson
Affiliation:
CNRS, LPICM, Ecole Polytechnique, 91128 Palaiseau, France
D. Daineka
Affiliation:
CNRS, LPICM, Ecole Polytechnique, 91128 Palaiseau, France
Antoine Michel
Affiliation:
CNRS, LPICM, Ecole Polytechnique, 91128 Palaiseau, France
J.F. Lerat
Affiliation:
Excico Group NV,KempischeSteenweg 305/2, B-3500 Hasselt, Belgium
Thierry Emeraud
Affiliation:
Excico Group NV,KempischeSteenweg 305/2, B-3500 Hasselt, Belgium
Pere Roca i Cabarrocas
Affiliation:
CNRS, LPICM, Ecole Polytechnique, 91128 Palaiseau, France
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Abstract

The use of a laser annealing and chemical texturing process (dubbed the LaText process) on room-temperature sputtered ZnO:Al has been shown to generate unusually high haze properties, favorable for thin film silicon solar cells.This is due to the melting of the ZnO:Al layer by the XeCl laser, and the formation of crystalline domains onthe surface, for which the grains and grain boundaries are subsequently etched at different rates. The unusual surface morphology produced through this process can strongly impact the nature of the amorphous or microcrystalline silicon material deposited thereupon. In this paper, we report on results for amorphous silicon devices, for which the surface texture is seen to slightly impact thelight absorption in the material, but more interestingly, also the light-induced degradation of the cells.For co-deposited cells, devices deposited on surfaces with the characteristic "LaText" morphologyundergo a much lesser degradation. Furthermore, the decreased degree of degradation coincides with a notable shift in the Raman scattering peak. This provides a rapid diagnostic for testing multiple textures and deposition parameters.

Keywords

texturetransparent conductorlaser annealing
Type
Articles
Information
MRS Online Proceedings Library (OPL) , Volume 1536: Symposium A – Film Silicon Science and Technology , 2013 , pp. 45 - 50
Copyright
Copyright © Materials Research Society 2013 

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References

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