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Influence of low thermal budget pre-anneals on the high temperature redistribution of low energy boron implants in silicon

Published online by Cambridge University Press:  21 March 2011

F. Boucard ,
M. Schott ,
D. Mathiot ,
P. Rivallin ,
P. Holliger  and
E. Guichard
F. Boucard
Affiliation:
SILVACO France, 8, Avenue de vignate, F-38610 GIERES, France PHASE/CNRS,23 rue du Loess, BP 20, F-67037 STRASBOURG Cedex 2, France LETI, CEA GRENOBLE, 17 avenue des martyrs, F-38054 GRENOBLE Cedex 9, France
M. Schott
Affiliation:
PHASE/CNRS,23 rue du Loess, BP 20, F-67037 STRASBOURG Cedex 2, France
D. Mathiot
Affiliation:
PHASE/CNRS,23 rue du Loess, BP 20, F-67037 STRASBOURG Cedex 2, France
P. Rivallin
Affiliation:
LETI, CEA GRENOBLE, 17 avenue des martyrs, F-38054 GRENOBLE Cedex 9, France
P. Holliger
Affiliation:
LETI, CEA GRENOBLE, 17 avenue des martyrs, F-38054 GRENOBLE Cedex 9, France
E. Guichard
Affiliation:
SILVACO France, 8, Avenue de vignate, F-38610 GIERES, France
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Abstract

It is now well established that the transient enhanced diffusion (TED) of ion implanted boron in silicon limits the formation of the ultra-shallow junctions required for the extreme deep sub- micron devices. It is also known that this TED is linked to the fate (elimination and agglomeration) of ion implantation related excess self-interstitials. Thus it can be expected that the final high temperature redistribution is at least partly governed by the effective initial point defect distribution at the onset of the high temperature plateau.

In this contribution we present the experimental evidence that low thermal pre-anneals, by affecting the initial self-interstitials distribution, affects boron redistribution during a subsequent high temperature anneal. Samples implanted with high dose boron at 3 keV were first annealed at 700°C for various durations. These samples, as well as reference samples without the pre-anneal, were then RTA annealed at various high temperatures around 1000°C. The resulting B profiles were measured by SIMS. It is found that the pre-annealed samples exhibits a clear reduction of the TED as compared with the reference ones.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 669: Symposium J – Si Front-End Processing–Physics and Technology of Dopant-Defect Interactions III , 2001 , J8.3
Copyright
Copyright © Materials Research Society 2001

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References

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