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Laser Deposition of Molybdenum Oxide Thin Films From Organometallic Precursors

Published online by Cambridge University Press:  21 February 2011

Kurt A. Olson  and
Glenn L. Schrader
Kurt A. Olson
Affiliation:
International Business Machines Corp., East Fishkill Facility, Route 52, Hopewell Junction, NY 12533–0999
Glenn L. Schrader
Affiliation:
Iowa State University, Dept. of Chemical Engineering, 231 Sweeney Hall, Ames, IA 50011–2230
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Abstract

Thin films of crystalline molybdenum oxides were formed on silicon surfaces by laser deposition. An ArF excimer laser was used to photodissociate molybdenum hexacarbonyl in an oxygen-containing ambient. Normal incidence of the laser led to the formation of very thin (< 1000 Å) films of crystalline MO4O11. The films were characterized by color, SEM, Raman spectroscopy, and X-ray diffraction.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 187: Symposium J – Thin Film Structures and Phase Stability , 1990 , 167
Copyright
Copyright © Materials Research Society 1990

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References

[1] Kihlborg, L. Arkiv Kemi 21, 471 (1963).Google Scholar
[2] Gilgen, H. H., Cacouris, T., Shaw, P. S., Krchnavek, R. R., Osgood Appl. Phys. B 42, 55 (1987).Google Scholar
[3] Flynn, D. K., Steinfeld, J. I., Sethi, D. S. J. Appl. Phys. 59(11), 3914 (1986).Google Scholar
[4] Solanki, R., Boyer, P. K., Mahan, J. E., Collins, G. J. Appl. Phys, Lett. 38(7), 572 (1981).Google Scholar
[5] Kovall, G. A., Matthews, J. C., Solanki, R. in Photon. Beam. and Plasma Stimulated Chemical Processes at Surfaces, edited by Donnelly, V. M., Herman, I. P., Hirose, M. (Mater. Res. Soc. Proc. 60, Pittsburgh, PA 1987) p. 145.Google Scholar
[6] Mayer, T. M., Fisanick, G. J., Eichelberger, T. S. IV J. Appl Phys 53(12), 8462 (1982).Google Scholar
[7] Gluck, N. S., Wolga, G. J., Bartosch, C. E., Ho, W., Ying, Z. J. Appl. Phys. 61(3), 998 (1987).Google Scholar
[8] Gupta, P. K., Chopra, K. L. Appl. Phys. Lett. 51(19), 1527 (1987).Google Scholar
[9] Carcia, P. F., McCarron, E. M. III Thin Solid Films 155, 53 (1987).Google Scholar
[10] Saito, Y., Kaito, C., Naiki, T. J.Cryst. Growth 79, 436 (1986).Google Scholar
[11] Miyata, N., Akiyoshi, S. J. Appl. Phys. 54(8), 1651 (1985).Google Scholar
[12] Tracy, C. E., Benson, D. K. J. Vac. Sci. Technol. A 4(5), 2377 (1986).Google Scholar