Hostname: page-component-6bf8c574d5-956mj Total loading time: 0 Render date: 2025-02-22T16:59:35.388Z Has data issue: false hasContentIssue false
  • English
  • Français

Laser-Induced Deposition of Buried Insulator Lines in Mn-Zn Ferrite

Published online by Cambridge University Press:  25 February 2011

Y.F. Lu  and
M. Takai
Y.F. Lu
Affiliation:
Department of Electrical Engineering, National University of Singapore, Singapore 0511
M. Takai
Affiliation:
Department of Electrical Engineering, Osaka University, Osaka 560, Japan
Get access

Abstract

Maskless etching of single crystalline Mn-Zn ferrite (MnO: ZnO: Fe2O3 = 31:17:52) has been investigated in a SiCl4 atmosphere by Ar+ laser irradiation. The ferrite substrate can be thermochemically etched by a single scan of a laser beam. Silicon oxide was deposited simultaneously in the etched groove. The deposited silicon oxide lines were investigated by AES, XPS and RBS. It is found that the deposited lines were stoichiometric SiO2 under specific conditions. The etching and deposition process can be controlled by changing the SiCl4 gas pressure. A planarized SiO2 layer buried in ferrite was found not to affect the magnetic characteristics of the ferrite layer.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 236: Symposium B – Photons and Low Energy Particles in Surface Processing , 1991 , 139
Copyright
Copyright © Materials Research Society 1992

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

1. Osgood, R.M. Jr, Brueck, S.R.J., Schlossberg, H.R. (eds.): Laser Diagnostics and Photochemical Processing for Semiconductors (North-Holland, Amsterdam 1983)Google Scholar
2. Johnson, A.W., Ehrlich, D.J., Schlossberg, H.R. (eds.): Laser-Controlled Chemical Processing of Surfaces, (North-Holland, Amsterdam 1984)Google Scholar
3. Bäuerle, D.(ed.): Laser Processing and Diagnostics, (Springer, Berlin, Heidelberg 1984)CrossRefGoogle Scholar
4. Ehrlich, D.J., Tsao, J.Y. (eds.): Laser Microfabrication - Thin Film Processes and Lithography, (Academic, San Diego 1989)Google Scholar
5. Biuerle, D.(ed.): Chemical Processing with Lasers, (Springer-Verlag, Berlin, Heidelberg 1986)Google Scholar
6. Boyd, I.W.: Laser Processing of Thin Films and Microstructures, (Springer-Verlag, Berlin, Heidelberg 1987)Google Scholar
7. Boyd, I.W., Rimini, E. (eds.): Beam Processing and Laser Chemistry, (North-Holland, Amsterdam, 1989)Google Scholar
8. Boyd, I.W., Krimmel, E.F. (eds.): Photo, Beam and Plasma Assisted Processing (North-Holland, Amsterdam, 1989)Google Scholar
9. Takai, M., Lu, Y.F., Koizumi, T., Nagatomo, S., and Namba, S., Appl. Phys. A46, 197(1988)Google Scholar
10. Lu, Y.F., Takai, M., Nagatomo, S., and Namba, S., Appl. Phys. A47, 319(1988)Google Scholar
11. Lu, Y.F., Takai, M., Nagatomo, S., Minamisono, T., and Namba, S., Jpn. J. Appl. Phys. 28, 2151(1989)Google Scholar
12. Lu, Y.F., Takai, M., Chayahara, A., Satou, M., Sanda, H., Nagatomo, S., and Naniba, S., Jpn J. Appl. Phys. 29, 2260(1990)CrossRefGoogle Scholar
13. Lu, Y.F., Takai, M., Nakata, T., Nagatomo, S., and Namba, S., Appl. Phys. A52, 129(1991)Google Scholar
14. Lu, Y.F., Takai, M., Nagatomo, S., and Namba, S., Appl. Phys. B53, 39(1991)Google Scholar
15. Takai, M., Tokuda, J., Nakai, H., Gamo, K., and Namba, S., Jpn.J.Appl.Phys. 22, L757(1983)CrossRefGoogle Scholar
16. Tokuda, J., Takai, M., Nakai, H., Gamo, K., and Namba, S., Opt. Soc. Am. B4, 267(1987)CrossRefGoogle Scholar
17. Takai, M., Tokuda, J., Nakai, H., Gamo, K., and Namba, S.: Laser Controlled Chemical Processing of Surfaces, eds. Johnson, A.W., Ehrhich, D.J. and Schlossberg, H.R. (North-Holland, New York, 1984), p. 211 Google Scholar
18. Takai, M., Matsunaga, K., Inoue, K., Izumi, M., Gamo, K., Sato, M., and Namba, S.: Jpn. J. Appl. Phys. 23, L239(1987)Google Scholar
19. Moody, J.E., and Hendel, R.H., J. Appl. Phys. 53, 4364(1982)CrossRefGoogle Scholar
20. Jpn. Chem. Soc.: Handbook of Chemistry (Fundamental II), (Maruzen, Tokyo, 1984), p. 322 Google Scholar
21. Chu, W.K., Mayer, J.W., and Nicolet, M.A.: Backscattering Spectrometry, (Academic Press, New York, 1978), p.80 Google Scholar