Hostname: page-component-745bb68f8f-lrblm Total loading time: 0 Render date: 2025-01-15T00:56:39.270Z Has data issue: false hasContentIssue false
  • English
  • Français

Measurement and Modeling of Atomic Chlorine Concentrations in Plasma Processes

Published online by Cambridge University Press:  22 February 2011

Jean-Philippe Nicolai ,
Kenneth D. Allen  and
Herbert H. Sawin
Jean-Philippe Nicolai
Affiliation:
Massachusetts Institute of Technology, Dept. of Chemical Engineering, Cambridge, MA 02139
Kenneth D. Allen
Affiliation:
Honeywell SSED, 12001 State Highway 55, Plymouth, MN 55441
Herbert H. Sawin
Affiliation:
Massachusetts Institute of Technology, Dept. of Chemical Engineering, Cambridge, MA 02139
Get access

Abstract

Spatially resolved concentration profiles of ground-state chlorine atoms were measured in CF3 Cl/Ar RF plasmas using two-photon laser induced fluorescence. A significant Cl gradient was found between the two electrodes under conditions typical for plasma etching. This experimental observation is consistent with previous model predictions which assumed the primary loss of Cl was a second-order surface recombination on the upper electrode which is partially limited by gaseous diffusion.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 117: Symposium C – Process Diagnostics: Materials, Combustion, Fusion , 1988 , 35
Copyright
Copyright © Materials Research Society 1988

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

1. Mogab, C.J. and Levinstein, H.L., J. Vac. Sci. Technol. 17, 721 (1980).Google Scholar
2. Schwartz, G.C. and Schaible, P.M., J. Vac. Sci. Technol. 16, 410 (1979).Google Scholar
3. Richards, A.D., Thompson, B.E., Allen, K.D., and Sawin, H.H., J. Appl. Phys. 62, 792 (1987).Google Scholar
4. Wormhoudt, J., Stanton, A.C., Richards, A.D., and Sawin, H.H., J. Appl. Phys. 61, 142 (1987).Google Scholar
5. Heaven, M.C., Miller, T.A., Freeman, R., White, J.C., and Bokor, J., Chem. Phys. Lett. 86, 458 (1982).Google Scholar
6. Selwyn, G.S., Baston, L.D., and Sawin, H.H., Appl. Phys. Lett. 51, 898 (1987).CrossRefGoogle Scholar
7. Allen, K.D., Sawin, H.H., Yokozeki, A., J. Electrochem. Soc. 133, 2331 (1986).Google Scholar
8. Allen, K.D., Sawin, H.H., Mocella, M.T., Jenkins, M.W., J. Electrochem. Soc. 133, 2315 (1986).CrossRefGoogle Scholar
9. Allen, K.D., Ph.D. Thesis, Massachusetts Institute of Technology, 1986.Google Scholar
10. Winters, H.F. and Inokuti, M., Phys. Rev. A 25, 1420 (1982)Google Scholar
11. Kunetsova, S.V. and Maslov, A.I., Khym. Vys. Energ. 13(5), 448 (1979).Google Scholar
12. Cariou, J. and Luc, P., Atlas du Spectre d'Absorption de la Molecule de Tellure, Eds. du, C.N.R.S., Paris (1980).Google Scholar
13. Thoman, J.W. Jr., Suzuki, K., Kable, S.H., and Steinfeld, J.I., J. Appl. Phys. 60, 2775 (1986)Google Scholar
14. Surendra, M., S. B. thesis, Massachusetts Institute of Technology, 1985.Google Scholar