Published online by Cambridge University Press: 01 February 2011
Mixed abrasive slurries (MAS) containing alumina/silica and alumina/ceria abrasives were evaluated for CMP of metal and dielectric films, respectively. MAS with 0.5wt% calcined alumina and 2.5wt% silica (fumed and colloidal) abrasives were highly selective to tantalum polishing over copper and oxide. Similarly, MAS containing 1.5wt% calcined alumina and 3wt% colloidal ceria particles offered a polish rate selectivity between silicon dioxide and silicon nitride films of more than 30, without any additives, without compromising finished surface quality. This improved performance appears to be a result of modified surface morphology as well as synergistic interactions between the chemical activity of silica or ceria and the hardness of the alumina.
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