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Nanopatterned Si(001) Substrates as Templates for Quantum Dot Growth
Published online by Cambridge University Press: 10 February 2011
Abstract
It has been shown recently, that the formation of GeSi quantum dots on Si(001) is strongly affected by the surface properties of the substrate. With an increasing number of missing dimer vacancies the growth mode can even change from a Stranski-Krastanow to a kinetic 3D island growth mode. Here we report on atomically resolved scanning tunneling microscopy images of Si(001) after different preparation procedures, namely the conventional high temperature procedure employed for commercial wafers, and Shiraki-type samples which require only low temperature treatment. The latter method yields an atomically flat Si(001) (2 × 1) surface, however, with a defect (ad- and missing dimers) concentration depending on the respective preparation conditions. Furthermore, repeated flashing occasionally yields a (2 × n) reconstructed surface consisting of well-ordered self-assembled trenches of missing dimers, similar to the ones discussed controversially in the previous literature. From our results we can clearly exclude contaminants to be involved.
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- Copyright © Materials Research Society 2003
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