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PFC Concentration and Recycle

Published online by Cambridge University Press:  15 February 2011

Glenn M. Tom ,
James McManus ,
William Knolle  and
Ilse Stoll
Glenn M. Tom
Affiliation:
Novapure Corporation, 7 Commerce Dr., Danbury CT 06810
James McManus
Affiliation:
Novapure Corporation, 7 Commerce Dr., Danbury CT 06810
William Knolle
Affiliation:
AT&T Microelectronics, 555 Union Blvd., Allentown PA 18103
Ilse Stoll
Affiliation:
AT&T Microelectronics, 555 Union Blvd., Allentown PA 18103
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Abstract

The semiconductor industry uses PFC gases such as CF4 and C2F6 as etchant and cleaning gases during plasma processes. The gases do not fully react within the reactor chamber. The unused gases enter the atmosphere through the process effluent. These gases have long persistence in the atmosphere and absorb infrared radiation. The PFC gases are, therefore, potential global warming gases. A method is described that will recover and recycle PFC gases.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 344: Symposium I – Materials and Processes for Environmental Protection , 1994 , 267
Copyright
Copyright © Materials Research Society 1994

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