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Photo-Polymerized Acrylic Waveguides for Optical Interconnects

Published online by Cambridge University Press:  21 February 2011

Robert R. Krchnavek ,
Gail R. Lalk  and
Robert Denton
Robert R. Krchnavek
Affiliation:
Bellcore, Navesink Research and Engineering Center, Red Bank, NJ 07701
Gail R. Lalk
Affiliation:
Bellcore, Morris Research and Engineering Center, Morristown, NJ 07960
Robert Denton
Affiliation:
2203 Sweetbriar Rd, Morrisville, PA 19067
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Abstract

We have fabricated acrylic based optical channel waveguides using proximity photolithography as well as laser direct writing. The cladding layer is a photosensitive aliphatic urethane dimethacrylate and the guiding layer is a photosensitive aromatic acrylated epoxy. This material system provides good adhesion to a variety of substrate materials. Since both the guiding and cladding layers are applied, these materials can be employed in several electrical/optical applications including multi-chip modules using Si, SiO2, and polyimide as well as high speed electronic board technologies using teflon based substrates.

Loss measurements show a guide loss of less than 0.08 dB/cm for multi-mode waveguides fabricated using the direct write laser technique. Lithographically defined guides have a loss of 0.3 dB/cm for similar size waveguides.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 228: Symposium N – Materials for Optical Information Processing , 1991 , 95
Copyright
Copyright © Materials Research Society 1992

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References

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