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Plasma Impulse CVD Deposited TiO2 Waveguiding Films: Properties and Potential Applications in Integrated Optical Sensor Systems

Published online by Cambridge University Press:  15 February 2011

M. Heming ,
B. Danielzik ,
J. Otto ,
V. Paquet  and
Ch. Fattinger
M. Heming
Affiliation:
SCHOTT Glaswerke, P.O.B. 2480, D-6500 Mainz, FRG
B. Danielzik
Affiliation:
SCHOTT Glaswerke, P.O.B. 2480, D-6500 Mainz, FRG
J. Otto
Affiliation:
SCHOTT Glaswerke, P.O.B. 2480, D-6500 Mainz, FRG
V. Paquet
Affiliation:
SCHOTT Glaswerke, P.O.B. 2480, D-6500 Mainz, FRG
Ch. Fattinger
Affiliation:
F. Hoffmann-La Roche Ltd., Grenzacherstrasse 124, CH-4002 Basel, Switzerland
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Abstract

Plasma impulse CVD deposited titania thin films, deposited at low substrate temperatures, exhibit low volume losses of < 0.2 dB/cm and high environmental stability. Their use in novel concepts for integrated optical immunosensors is discussed.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 276: Symposia U/Y – Smart Materials Fabrication and Materials for Micro-Electro-Mechanical Systems , 1992 , 117
Copyright
Copyright © Materials Research Society 1992

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References

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