Crossref Citations
This article has been cited by the following publications. This list is generated based on data provided by
Crossref.
Paskova, T.
Goldys, E.M.
and
Monemar, B.
1999.
Hydride vapour-phase epitaxy growth and cathodoluminescence characterisation of thick GaN films.
Journal of Crystal Growth,
Vol. 203,
Issue. 1-2,
p.
1.
Paskova, T.
Birch, J.
Tungasmita, S.
Beccard, R.
Heuken, M.
Svedberg, E. B.
Runesson, P.
Goldys, E. M.
and
Monemar, B.
1999.
Thick Hydride Vapour Phase Epitaxial GaN Layers Grown on Sapphire with Different Buffers.
physica status solidi (a),
Vol. 176,
Issue. 1,
p.
415.
Nikitina, I.
Mosina, G.
Melnik, Yu.
Nikolaev, A.
and
Vassilevski, K.
1999.
Dislocation structure of GaN bulk crystals grown on SiC substrates by HVPE.
Materials Science and Engineering: B,
Vol. 61-62,
Issue. ,
p.
325.
Miskys, C. R.
Kelly, M. K.
Ambacher, O.
and
Stutzmann, M.
1999.
MOCVD-Epitaxy on Free-Standing HVPE-GaN Substrates.
physica status solidi (a),
Vol. 176,
Issue. 1,
p.
443.
Paskova, T
Goldys, E.M
Yakimova, R
Svedberg, E.B
Henry, A
and
Monemar, B
2000.
Influence of growth rate on the structure of thick GaN layers grown by HVPE.
Journal of Crystal Growth,
Vol. 208,
Issue. 1-4,
p.
18.
Nikolaev, V. I.
Shpeizman, V. V.
and
Smirnov, B. I.
2000.
Determination of elastic moduli of GaN epitaxial layers by microindentation technique.
Physics of the Solid State,
Vol. 42,
Issue. 3,
p.
437.
Melnik, Yu.
Tsvetkov, D.
Pechnikov, A.
Nikitina, I.
Kuznetsov, N.
and
Dmitriev, V.
2001.
Characterization of AlN/SiC Epitaxial Wafers Fabricated by Hydride Vapour Phase Epitaxy.
physica status solidi (a),
Vol. 188,
Issue. 1,
p.
463.
Paskova, T.
Paskov, P.P.
Darakchieva, V.
Tungasmita, S.
Birch, J.
and
Monemar, B.
2001.
Defect Reduction in HVPE Growth of GaN and Related Optical Spectra.
physica status solidi (a),
Vol. 183,
Issue. 1,
p.
197.
Kim, H.M.
Oh, J.E.
and
Kang, T.W.
2001.
Preparation of large area free-standing GaN substrates by HVPE using mechanical polishing liftoff method.
Materials Letters,
Vol. 47,
Issue. 4-5,
p.
276.
Vaudo, R.P.
Xu, X.
Loria, C.
Salant, A.D.
Flynn, J.S.
and
Brandes, G.R.
2002.
GaN Boule Growth: A Pathway to GaN Wafers with Improved Material Quality.
physica status solidi (a),
Vol. 194,
Issue. 2,
p.
494.
Liu, L.
and
Edgar, J.H.
2002.
Substrates for gallium nitride epitaxy.
Materials Science and Engineering: R: Reports,
Vol. 37,
Issue. 3,
p.
61.
Melnik, Yu.V.
Soukhoveev, V.A.
Tsvetkov, K.V.
and
Dmitriev, V.A.
2003.
First AlGaN Free-Standing Wafers.
MRS Proceedings,
Vol. 764,
Issue. ,
Sands, T. D.
Wong, W. S.
and
Cheung, N. W.
2004.
Wafer Bonding.
Vol. 75,
Issue. ,
p.
377.
Figge, S.
Kruse, C.
Paskova, T.
and
Hommel, D.
2004.
Crystal Growth - From Fundamentals to Technology.
p.
295.
Kovalenkov, O.
Soukhoveev, V.
Ivantsov, V.
Usikov, A.
and
Dmitriev, V.
2005.
Thick AlN layers grown by HVPE.
Journal of Crystal Growth,
Vol. 281,
Issue. 1,
p.
87.
Fujito, Kenji
Kubo, Shuichi
and
Fujimura, Isao
2009.
Development of Bulk GaN Crystals and Nonpolar/Semipolar Substrates by HVPE.
MRS Bulletin,
Vol. 34,
Issue. 5,
p.
313.
Grzegory, I.
Boćkowski, M.
and
Porowski, S.
2010.
Bulk Crystal Growth of Electronic, Optical & Optoelectronic Materials.
p.
173.
Hemmingsson, Carl
Monemar, Bo
Kumagai, Yoshinao
and
Koukitu, Akinori
2010.
Springer Handbook of Crystal Growth.
p.
869.
Zhilyaev, Yu. V.
and
Rodin, S. N.
2010.
Chloride vapor-phase epitaxy of gallium nitride at a reduced source temperature.
Technical Physics Letters,
Vol. 36,
Issue. 5,
p.
397.
Ashraf, H.
Kudrawiec, R.
Weyher, J.L.
Serafinczuk, J.
Misiewicz, J.
and
Hageman, P.R.
2010.
Properties and preparation of high quality, free-standing GaN substrates and study of spontaneous separation mechanism.
Journal of Crystal Growth,
Vol. 312,
Issue. 16-17,
p.
2398.