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Site-specific formation of nanoporous silicon on micro-fabricated silicon surfaces

Published online by Cambridge University Press:  26 February 2011

Fung Suong Ou ,
Laxmikant V. Saraf  and
Donald R. Baer
Fung Suong Ou
Affiliation:
Environmental Molecular Science Laboratory, Pacific Northwest National Laboratory, Richland, Washington 99352
Laxmikant V. Saraf
Affiliation:
Environmental Molecular Science Laboratory, Pacific Northwest National Laboratory, Richland, Washington 99352
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Abstract

We demonstrated an ability to control the location of the porous silicon formation during electro-chemical etching by the introduction of micro- fabricated defects. This ability may open new doors for chemical and biological applications of porous silicon. In this paper, we have focused on the experimental procedure used to form this site-specific porous silicon area on micro- fabricated silicon surface. We also compared our results with work carried out by Saraf et al[1] during the early stage of porous silicon formation in conventional electrochemical etching.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 829: Symposium B – Progress in Compound Semiconductor Materials IV – Electronic and Optoelectronic Applications , 2004 , B9.27
Copyright
Copyright © Materials Research Society 2005

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References

REFERENCES

1. Saraf, L. V, Baer, D. R., Wang, Z., Young, J., Engelhard, M.H.. In Preparation.Google Scholar
2. Canham, L. T., Appl. Phys. Lett. 1990, 57, 1049.Google Scholar
3. Hamilton, B., Semicond. Sci. Technol. 1995, 10, 1187.Google Scholar
4. Stewart, M. P., Buriak, J. M., Adv. Mater. 2000, 12, 12, 859.Google Scholar
5. Thust, M., Schöning, M J, Frohnhoff, S, Arens-Fischer, R, Kordos, P, Lüth, H. Meas. Sci. Technol. 1996, 7, 26.Google Scholar
6. Schöning, M J, Ronkel, F., Crott, M., Thust, M., Schultze, J. W., Kordos, P, Lüth, H, Elecrochimica Acta. 1997, 42, 3185.Google Scholar
7. Drott, J, Lindström, K., Rosengren, L., Laurell, T., J. Micromech. Microeng. 1997, 7, 14.Google Scholar