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Soft X-Ray Photoelectron Spectroscopy Of Bi-Metallic Interfacial Bonding

Published online by Cambridge University Press:  15 February 2011

N. D. Shinn ,
B. Kim ,
A. B. Andrews ,
J. L. Erskine ,
K. J Kim  and
T.-H. Kang
N. D. Shinn*
Affiliation:
Sandia National Laboratories, Department 1114, Albuquerque, NM 87185
B. Kim
Affiliation:
Pohang Accelerator Laboratory, Pohang Institute of Science and Technology, Pohang 790-600, Korea
A. B. Andrews
Affiliation:
Pohang Accelerator Laboratory, Pohang Institute of Science and Technology, Pohang 790-600, Korea
J. L. Erskine
Affiliation:
Department of Physics, The University of Texas at Austin, Austin, TX 78712
K. J Kim
Affiliation:
Department of Physics, Kon-Kuk University, Seoul 133–701, Korea
T.-H. Kang
Affiliation:
Department of Physics, Kon-Kuk University, Seoul 133–701, Korea
*
(1)Author to whom correspondence should be addressed.
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Abstract

We report the first application of Soft X-ray Photoelectron Spectroscopy (SXPS) to probe the bonding at epitaxial, bi-metallic interfaces with atomic-layer spatial selectivity. Specifically, we have measured the W(4f)7/2 levels of interfacial tungsten atoms for (1×1)Fe/W(110), (1×1)Ni/W(110), and (1×1)PtW(110). For clean W(110), the surface atoms exhibit a W(4f)7/2 peak at -320 meV binding energy with respect to the bulk W(4f)7/2 peak. Upon formation of the metallic overlayers, the interfacial tungsten atoms contribute W(4f)7/2 peaks at -225 meV (Fe/W), -140 meV (Ni/W), and +70 meV (Pt/W) with respect to the bulk W(4f)7/2 peak. The systematic reduction in the binding energy difference between interfacial and bulk tungsten atoms for Fe, Ni, and Pt correlates with increasing heats of adsorption on W(110), as determined by Temperature Programmed Desorption. This suggests that SXPS, in combination with first principles calculations and Born-Haber thermochemical cycle analyses, can be used as a non-destructive probe of bi-metallic interfacial bonding energies.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 307: Symposium L – Applications of Synchrotron Radiation Techniques to Materials Science , 1993 , 167
Copyright
Copyright © Materials Research Society 1993

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Footnotes

(2)

Present address: National Synchrotron Light Source, Building 725A-U3, Brookhaven National Laboratory, Upton, NY 11973-5000.

References

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