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Sputter deposited ZnO porous films for sensing applications

Published online by Cambridge University Press:  18 January 2013

Michał A. Borysiewicz
Affiliation:
Institute of Electron Technology, Al. Lotników 32/46, 02-668 Warsaw, Poland
Elżbieta Dynowska
Affiliation:
Institute of Electron Technology, Al. Lotników 32/46, 02-668 Warsaw, Poland Institute of Physics, PAS, Al. Lotników 32/46, 02-668 Warsaw, Poland
Valery Kolkovsky
Affiliation:
Institute of Physics, PAS, Al. Lotników 32/46, 02-668 Warsaw, Poland
Maciej Wielgus
Affiliation:
Institute of Electron Technology, Al. Lotników 32/46, 02-668 Warsaw, Poland Warsaw University of Technology, Pl. Politechniki 1, 00-661 Warsaw, Poland
Krystyna Gołaszewska
Affiliation:
Institute of Electron Technology, Al. Lotników 32/46, 02-668 Warsaw, Poland
Eliana Kamińska
Affiliation:
Institute of Electron Technology, Al. Lotników 32/46, 02-668 Warsaw, Poland
Marek Ekielski
Affiliation:
Institute of Electron Technology, Al. Lotników 32/46, 02-668 Warsaw, Poland
Przemysław Struk
Affiliation:
Silesian University of Technology, ul. Akademicka 2A, 44-100 Gliwice, Poland
Tadeusz Pustelny
Affiliation:
Silesian University of Technology, ul. Akademicka 2A, 44-100 Gliwice, Poland
Anna Piotrowska
Affiliation:
Institute of Electron Technology, Al. Lotników 32/46, 02-668 Warsaw, Poland
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Abstract

Nanoporous ZnO films are fabricated using a two step approach: sputter deposition of porous Zn followed by an ex-situ annealing in an oxygen flow at 400°C. The created structures have a porosity of 34% enabling use in surface-based absorption sensors. The films are used in a resistance-based sensor allowing easy discrimination between liquid methanol and ethanol by resistance measurements and also in a transmission-based sensor to detect NO2, NH3 and H2 gases in concentration as low as 500 ppm.

Type
Articles
Copyright
Copyright © Materials Research Society 2013 

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References

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