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Sputter Etching Effect on Magnetic Properties in TaOx/TbFeCo/Ag Layered Films

Published online by Cambridge University Press:  21 February 2011

Takumi Shimamori ,
Hidemi Yoshida  and
Yoshimitsu Kobayashi
Takumi Shimamori
Affiliation:
Mitsubishi Kasei Corporation, Thin Films Laboratory, Yokohama, Japan
Hidemi Yoshida
Affiliation:
Mitsubishi Kasei Corporation, Thin Films Laboratory, Yokohama, Japan
Yoshimitsu Kobayashi
Affiliation:
Mitsubishi Kasei Corporation, Thin Films Laboratory, Yokohama, Japan
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Abstract

Sputter etching effect on magnetic properties was investigated in TaOx/TbFeCo/Ag layered films. With sputter etching, smooth interfaces of about lnm roughness were obtained. In films with smooth interfaces, magnetization was stabilized and magnetization reversal was sharpened at around the Curie temperature. As a result, recorded marks were stabilized, and the media became sensitive to the magnetic field for writing. 49dB was obtained as C/N even at 0.45μm mark length, which is sufficient for digital recording.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 318: Symposium Ca – Interface Control of Electrical, Chemical, and Mechanical Properties , 1993 , 457
Copyright
Copyright © Materials Research Society 1994

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References

REFERENCES

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