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Strain Relaxation and Oxide Formation on Annealed W/CMultilayers
Published online by Cambridge University Press: 15 February 2011
Abstract
Tungsten-carbon (W/C) Multilayer structures are used as X-ray mirrors andother optical elements. The optical properties of such elements are highlysensitive to changes in strain due to thermal processing. Sensitivecurvature measurements were performed on 40A period W/C Multilayerstructures on Si substrates using a two beam laser reflection technique. Acompressive stress of approximately 1530 MPa was measured in these sputteredmultilayer films. Thermal annealing to 500 C in air and under vacuumresulted in very little strain relaxation in the multilayers but X-raydiffraction data show a slight increase of the multilayer period.Significant strain relaxation, though, was observed when a 400Å W bufferlayer was included. Thermal annealing of these samples to 400–500°C resultedin large strain relaxation due to the formation of a-W crystals in thebuffer layer. Moderate oxide formation on air annealed samples as measuredby SIMS was shown not to be a dominant mechanism of strain relaxation.
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- Copyright © Materials Research Society 1994