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Published online by Cambridge University Press: 03 September 2012
Nanocrystalline films of Al-Co and Al-Co-O are deposited on glass substrates using Ar and (Ar + O2) gas mixture by IB and IAB deposition techniques. The structure of the films is investigated by X-ray diffraction. Annealed (500°C/ 0.5 h / Vacuum) films show a preferred Co<111> + Al<200> crystallographic orientation. The crystallite size estimated from the line broadening of Co<111> + Al<2007gt;reflections lies between 4 and 12 nm. The value of Mx/Ms increases with decreasing Co concentration from 0.2 (74 at.%) to 0.4 (46 at.%) for IB(Ar) films, where Mr and Ms are the remanence and saturation magnetizations respectively. IB (Ar + O2) and IAB (Ar + O2) films of the same composition A154Co46Ox show different magnetic behaviour.
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