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Surface Passivation of AlGaN terminated and GaN Terminated HEMT Structures Studied by XPS

Published online by Cambridge University Press:  11 February 2011

B. P. Gila
Affiliation:
Dept. of Materials Science and Engineering, University of Florida, Gainesville, FL 32611
E. Lambers
Affiliation:
Dept. of Materials Science and Engineering, University of Florida, Gainesville, FL 32611
B. Luo
Affiliation:
Dept. of Chemical Engineering, University of Florida, Gainesville, FL 32611
A. H. Onstine
Affiliation:
Dept. of Materials Science and Engineering, University of Florida, Gainesville, FL 32611
K. K. Allums
Affiliation:
Dept. of Materials Science and Engineering, University of Florida, Gainesville, FL 32611
C. R. Abernathy
Affiliation:
Dept. of Materials Science and Engineering, University of Florida, Gainesville, FL 32611
F. Ren
Affiliation:
Dept. of Chemical Engineering, University of Florida, Gainesville, FL 32611
S. J. Pearton
Affiliation:
Dept. of Materials Science and Engineering, University of Florida, Gainesville, FL 32611
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Abstract

Samples of both AlGaN and GaN terminated HEMT structures were studied using x-ray photo spectroscopy (XPS). It was found that the XPS spectra of both AlGaN and native oxide surfaces were shifted by a surface charge of 0.5 to 1.0 eV. The samples were then oxidized using an UV-ozone treatment for 25 minutes at room temperature. The ozone oxide XPS spectra of the AlGaN terminated surface was found to have the same 0.5 to 1.0 eV shift while the ozone oxide XPS spectra of the GaN terminated surface was found to have a 5.0 eV shift, indicating that the native GaN oxide is more insulating. Processed HEMT devices using both surface terminations were given the same UV-ozone treatment followed by a 10nm MBE grown Sc2O3 film for passivation. The GaN terminated HEMT structures showed on average a 10% increase in channel current (from gate-lag measurements, pulse mode) over the AlGaN terminated HEMT structures.

Type
Research Article
Copyright
Copyright © Materials Research Society 2003

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References

REFERENCES

1. Pearton, S.J., Zolper, J.C., Shul, R.J., Ren, F.; Journal of Applied Physics 86 (1), p. 178 (1999)Google Scholar
2. Green, B. M., Chu, K. K., Chumbes, E. M., Smart, J. A., Shealy, J. R., and Eastman, L. F., IEEE Electron. Dev. Lett., 21, 268(2000).Google Scholar
3. Binari, S. C., Kruppa, W., Dietrich, H. B., Kelner, G., Wickenden, A. E. and Freitas, J. A. Jr, Solid-State Electron., 41, 1549(1997).Google Scholar
4. Eastman, L. F., Tilak, V., Smart, J., Green, B. M., Chumbes, E. M., Dimitrov, R., Kim, H.; Ambacher, O. S., Weimann, N., Prunty, T., Murphy, M., Schaff, W. J., and Shealy, J. R., IEEE Trans. Electron Dev., 48, 479(2001).Google Scholar
5. Kohn, E., Daumiller, I., Schmid, P., Nguyen, N. X., Nguyen, C. N., Electron. Lett. 35, 1022(1999).Google Scholar
6. Lee, J.S.; Vescan, A., Wieszt, A., Dietrich, R., Leier, H., Kwon, Y.-S., Electron. Lett. 37, 130(2001).Google Scholar
7. Hu, X., Koudymov, A., Simin, G., Yang, J., Khan, M. Asif, Tarakji, A., Shur, M. S., and Gaska, R., Appl. Phys. Lett. 79, 2832(2001).Google Scholar
8. Nguyen, N. X., Nguyen, C. and Grider, D. E., Electron. Lett. 35, 1356(1999).Google Scholar
9. Daumiller, I., Kirchner, C., Kamp, M., Ebeling, K. J., and Kohn, E., IEEE Electron. Dev. Lett. 20, 448(1999).Google Scholar
10. Tarakji, A., Simin, G., Ilinskaya, N., Hu, X., Kumar, A., Koudymov, A., Yang, J., Khan, M. Asif, Shur, M. S., and Gaska, R., Appl. Phys. Lett. 78, 2169(2001).Google Scholar
11. Chumbes, E. M., Smart, J. A., Prunty, T. and Shealy, J. M., IEEE Trans. Electron Dev., 48, 416(2001).Google Scholar
12. Binari, S. C., Ikossi, K., Roussos, J. A., Kruppa, W., Park, D.; Dietrich, H. B., Koleske, D. D., Wickenden, A. E., and Henry, R. L., IEEE Trans. Electron Dev., 48, 465(2001).Google Scholar
13. Klein, P. B., Binari, S. C., Ikossi, K., Wickenden, A. E., Koleske, D. D., and Henry, R. L., Appl. Phys. Lett. 79, 3527(2001).Google Scholar
14. Klein, P. B., Freitas, J. A. Jr, Binari, S. C., and Wickenden, A. E., Appl. Phys. Lett. 75, 4016(1999).Google Scholar
15. Klein, P. B., Binari, S. C., Freitas, J. A. Jr, and Wickenden, A. E., J. Appl. Phys. 88, 2843(2000).Google Scholar
16. Klein, P. B., Binari, S. C., Ikossi-Anastasiou, K., Wickenden, A. E., Koleske, D. D., Henry, P. L., Katzer, D. S., IEEE Electron. Lett. 37, 661(2001).Google Scholar
17. Luo, B., Johnson, J.W., Gila, B.P., Onstine, A., Abernathy, C.R., Ren, F., Pearton, S.J., Baca, A.G., Dabiran, A.M., Wowchack, A.M., Chow, P.P., Solid-State Electronics v 46 n 4 April 2002 p 467476 Google Scholar
18. Luo, B, Johnson, JW, Kim, J, Mehandru, RM, Ren, F, Gila, BP, Onstine, AH, Abernathy, CR, Pearton, SJ, Baca, AG, Briggs, RD, Shul, RJ, Monier, C, Han, J; Applied Physics Letters 80 (9): 16611663 MAR 4 2002 Google Scholar
19. Luo, B., Mehandru, R., Kim, J., Ren, F., Gila, B.P., Onstine, A.H., Abernathy, C.R., Pearton, S.J., Fitch, R., Gillespie, J., Jenkins, T., Sewell, J., Via, D., Crespo, A., Irokawa, Y.; Journal of the Electrochemical Society 149 (11), pp. G613G619 (2002)Google Scholar
20. Prabhakaran, K., Andersson, T.G., Nozawa, K.; Applied Physics Letters 69 (21), p. 3212 (1996)Google Scholar
21. Zywietz, T.K., Neugebauer, J., Scheffier, M.; Applied Physics Letters 743 (12), p. 1695 (1999)Google Scholar
22. Watkins, N.J., Wicks, G.W., Gao, Y.; Applied Physics Letters 75 (17), p. 2602 (1999)Google Scholar
23. Nakasaki, R., Hashizume, T., Hasegawa, H.; Physica E 7, p. 953 (2000)Google Scholar
24. Wolter, S.D., DeLucca, J.M., Mohoney, S.E., Kern, R.S., Kuo, C.P.; Thin Solid Films 371, p. 153 (2000)Google Scholar
25. Shalish, I., Shapira, Y., Burstein, L., Salzman, J.; J. Applied Physics 89 (1), p. 390 (2001)Google Scholar
26. Gila, B.P., Johnson, J.W., Mehandru, R., Luo, B., Onstine, A.H., Allums, K.K., Krishnamoorthy, V., Bates, S., Abernathy, C.R., Ren, F., Pearton, S.J., phys. stat. solidi (a)188, p. 239 (2001)Google Scholar