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Synchrotron Radiation for Measurement of Contaminants on Silicon Surfaces

Published online by Cambridge University Press:  15 February 2011

Michael C. Madden ,
David C. Wherry ,
Piero Pianetta  and
Sean Brennan
Michael C. Madden
Affiliation:
Intel Corporation, P.O. Box 58119. Santa Clara, CA 95052-8119
David C. Wherry
Affiliation:
Fisons Instruments. 355 Shoreway Rd., San Carlos, CA 94070
Piero Pianetta
Affiliation:
Stanford Synchrotron Radiation Laboratory, P.O. Box 4349, Stanford, CA 94309
Sean Brennan
Affiliation:
Stanford Synchrotron Radiation Laboratory, P.O. Box 4349, Stanford, CA 94309
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Abstract

The detection limit for aluminum using total reflection x-ray fluorescence (TXRF) is approximately 100 times lower for a synchrotron source compared to a conventional source. The detection limit for transition metals is approximately 15 to 40 times lower depending on atomic number and energy of the incident radiation.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 307: Symposium L – Applications of Synchrotron Radiation Techniques to Materials Science , 1993 , 125
Copyright
Copyright © Materials Research Society 1993

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References

REFERENCES

1. Bertin, P., Principles and Practice of X-Ray Analysis, 2nd ed. (Plenum Press, New York-London), p. 529–532.Google Scholar