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VUV Synchrotron Light as a Technique for Studying the Interface Quality and Properties of Thin Overlayers

Published online by Cambridge University Press:  25 February 2011

M. W. Ruckman ,
V. Murgai  and
Myron Strongin
M. W. Ruckman
Affiliation:
Brookhaven National Laboratory, Physics Dept., Upton, N.Y. 11973
V. Murgai
Affiliation:
Brookhaven National Laboratory, Physics Dept., Upton, N.Y. 11973
Myron Strongin
Affiliation:
Brookhaven National Laboratory, Physics Dept., Upton, N.Y. 11973
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Abstract

The measurements presented here show the value of synchrotron light for determining both the electronic structure of overlayers, and the physical nature of the overlayer-substrate interface. A comparison is given between deposited layers and thermally stabilized layers. Estimates are also made of the bonding energy between the overlayer and substrate.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 41: Symposium K – Advanced Photon and Particle Techniques for the Characterization of Defects in Solids , 1984 , 349
Copyright
Copyright © Materials Research Society 1985

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References

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