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Waste Minimization In Semiconductor Processing

Published online by Cambridge University Press:  15 February 2011

Steven J. Hardwick  and
Joanne C. Mailloux
Steven J. Hardwick
Affiliation:
Novapure Corporation, 7 Commerce Drive, Danbury, CT 06810
Joanne C. Mailloux
Affiliation:
Novapure Corporation, 7 Commerce Drive, Danbury, CT 06810
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Abstract

The US semiconductor industry uses 5–7 thousand pounds of arsine annually. Fifty to eighty percent of the arsine used becomes a waste product, which requires abatement. Traditional methods of abatement are reviewed with an emphasis on dry chemical scrubbing. A variety of dry chemical scrubbing materials were evaluated for arsine capacity, using activated carbon as the baseline for comparison. A proprietary mixed oxide composition, employing copper oxide as the active ingredient was identified as having high capacity and efficiency. Disposal and possible reclamation options are discussed.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 344: Symposium I – Materials and Processes for Environmental Protection , 1994 , 273
Copyright
Copyright © Materials Research Society 1994

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References

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