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An Algorithm for Tailoring of Nanoparticles by Double Angle Resolved Nanosphere Lithography

Published online by Cambridge University Press:  10 February 2015

Christoph Brodehl ,
Siegmund Greulich-Weber  and
Jörg K. N. Lindner
Christoph Brodehl
Affiliation:
University of Paderborn, Dept. of Physics, Warburger Str. 100, 33098 Paderborn, Germany. Center for Optoelectronics and Photonics Paderborn (CeOPP), 33098 Paderborn, Germany.
Siegmund Greulich-Weber
Affiliation:
University of Paderborn, Dept. of Physics, Warburger Str. 100, 33098 Paderborn, Germany. Center for Optoelectronics and Photonics Paderborn (CeOPP), 33098 Paderborn, Germany.
Jörg K. N. Lindner
Affiliation:
University of Paderborn, Dept. of Physics, Warburger Str. 100, 33098 Paderborn, Germany. Center for Optoelectronics and Photonics Paderborn (CeOPP), 33098 Paderborn, Germany.
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Abstract

Nanosphere lithography (NSL) is a technique capable of creating large-area arrays of small objects with tailor-made shapes. Here we present an algorithm, which simulates the shape and morphology of nanoparticles produced via NSL in combination with physical vapor deposition from variable angles. The key idea is based on a ray-tracing technique. Mask clogging effects have a major influence on the shape of resulting nanoobjects and are therefore taken into account. In addition, we implemented a metaball concept for the precise description of thermally modified masks. The calculated results are compared exemplarily with atomic force microscopy (AFM) data of experimentally fabricated nanostructures.

Keywords

lithography (deposition)nanostructuresimulation
Type
Articles
Information
MRS Online Proceedings Library (OPL) , Volume 1748: Symposium II – Semiconductor Nanocrystals, Plasmonic Metal Nanoparticles, and Metal-Hybrid Structures , 2015 , mrsf14-1748-ii11-25
Copyright
Copyright © Materials Research Society 2015 

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References

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