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Atomic layer deposition of nanoparticles on self-assembled monolayer modified silicon substrate

Published online by Cambridge University Press:  17 May 2013

Kun Cao ,
Zhilong Ren ,
Shengmei Xiang ,
Bin Shan  and
Rong Chen
Kun Cao
Affiliation:
State Key Laboratory of Material Processing and Die & Mould Technology, School of Materials Science and Engineering,
Zhilong Ren
Affiliation:
State Key Laboratory of Material Processing and Die & Mould Technology, School of Materials Science and Engineering,
Shengmei Xiang
Affiliation:
State Key Laboratory of Material Processing and Die & Mould Technology, School of Materials Science and Engineering,
Bin Shan
Affiliation:
State Key Laboratory of Material Processing and Die & Mould Technology, School of Materials Science and Engineering,
Rong Chen*
Affiliation:
State Key Laboratory of Digital Manufacturing Equipment and Technology, School of Mechanical Science and Engineering, Huazhong University of Science and Technology, 1037 Luoyu Road, Wuhan, Hubei PR China 430074
*
*Corresponding author: rongchen@mail.hust.edu.cn
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Abstract

Atomic layer deposition has attracted much attention recently in fabricating noble metal nanoparticles for a wide range of applications. We have explored synthesizing palladium nanoparticles via atomic layer deposition on self-assembled monolayers modified silicon substrate. Using alkyltrichlorosilanes as the passivating agents, our results show the method is capable of fabricating Pd nanoparticles with well controlled density and particle diameter on the modified silicon substrate.

Keywords

atomic layer depositionPdnucleation & growth
Type
Articles
Information
MRS Online Proceedings Library (OPL) , Volume 1546: Symposium L – Nanoparticle Manufacturing, Functionalization, Assembly and Integration , 2013 , mrss13-1546-l06-14
Copyright
Copyright © Materials Research Society 2013 

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