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Atomic layer deposition ZnO film as seed layer for hydrothermal growth of ZnO nanorods

Published online by Cambridge University Press:  01 February 2011

Xianglin Li ,
Chuanwei Cheng  and
Hongjin Fan
Xianglin Li
Affiliation:
LIXI0034@ntu.edu.sg, Nanyang Technological University, Physics and Applied Physics, Singapore, Singapore
Chuanwei Cheng
Affiliation:
cwcheng@ntu.edu.sg, Nanyang Technological University, Physics and Applied Physics, Singapore, Singapore
Hongjin Fan
Affiliation:
fanhj@ntu.edu.sg
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Abstract

Atomic layer deposition (ALD) ZnO film as seed layer for growing aligned ZnO nanorods arrays is demonstrated. The effects of the deposition temperature and film thickness to the morphology of the ZnO nanorods are studied. The ALD is found to have its advantage over the conventional dip-coating method when being applied to three-dimensional (3D) substrates, as exemplified by the macroporous Si adn CNT arrays. As one example, the CNT-ZnO 3D hybrid nanostructures are obtained which might be useful for energy-related applications.

Keywords

atomic layer depositionhydrothermalnanostructure
Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 1258: Symposia P/Q/R – Low-Dimensional Functional Nanostructures-Fabrication, Characterization and Applications , 2010 , 1258-Q11-10
Copyright
Copyright © Materials Research Society 2010

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