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Atomistic Modeling of Ultrathin Fe Films on Cu (111)

Published online by Cambridge University Press:  10 February 2011

A. Rakotomahevitra ,
L. T. Wille  and
M. S. Rakotomalala
A. Rakotomahevitra
Affiliation:
Department of Physics, Florida Atlantic University, Boca Raton, Florida 33431
L. T. Wille
Affiliation:
Department of Physics, Florida Atlantic University, Boca Raton, Florida 33431
M. S. Rakotomalala
Affiliation:
Département de Physique, Université d'Antananarivo, Faculté des Sciences, BP 906, Antananarivo 101, Madagascar
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Abstract

We have used the embedded-atom method (EAM) to perform molecular-dynamics (MD) simulations of iron films grown on Cu (111). The iron atoms were randomly deposited, one at a time, above the surface just within the force range of the nearest surface atom. The growth mode is discussed by following the iron film coverage for an incident-atom energy ranged from 0.5eV to 15eV. A transition from island to layer by layer growth is observed as a function of incident energy. The effect of deposition rate is also studied.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 616: Symposium I – New Methods, Mechanisms & Models of Vapor Deposition , 2000 , 183
Copyright
Copyright © Materials Research Society 2000

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